Tailoring the nanoscale morphology of HKUST-1 thin films via codeposition and seeded growth

• Landon J. Brower,
• Lauren K. Gentry,
• Amanda L. Napier and
• Mary E. Anderson

Beilstein J. Nanotechnol. 2017, 8, 2307–2314, doi:10.3762/bjnano.8.230

• substrates [11][12][13][14]. The growth mechanism for HKUST-1 surMOF films fabricated by LBL deposition was found to be Volmer–Weber, with small crystallites nucleating and ripening on the substrate upon continued deposition cycles, as opposed to a van der Merwe growth mechanism that produces a conformal

• film [11][12]. For surMOF film growth via LBL deposition, it was found that temperature and surface chemistry (terminal functional group of SAM) control the crystal face growth of the crystallites on the substrate [11][12][15][16][17]. This provides some degree of control over roughness, particle size

• microscale [2][18][19]. To fabricate the MOF for integration, methods such as microcontact printing and nanografting have been utilized to create chemical patterns onto which the surMOF is selectively grown [20][21]. Confined geometries have been utilized in conjunction with conventional and nonconventional

Triptycene-terminated thiolate and selenolate monolayers on Au(111)

• Jinxuan Liu,
• Martin Kind,
• Björn Schüpbach,
• Daniel Käfer,
• Stefanie Winkler,
• Wenhua Zhang,
• Andreas Terfort and
• Christof Wöll

Beilstein J. Nanotechnol. 2017, 8, 892–905, doi:10.3762/bjnano.8.91

• identified to be an important parameter in SURMOF liquid epitaxial growth [3][21]. The higher thermal stability of the selenium anchor group compared to the one of the sulfur anchor group enables triptycene-selenolate SAMs to push the upper temperature limit available for SURMOF growth. We believe that these

• . Acknowledgements This work has been partially supported by the European Union (FP6 STReP SURMOF, NMP4-CT-2006-032109). Traveling costs for synchrotron measurements were provided by the German BMBF through Grant No. 05ESXBA/5. J. Liu thanks the IMPRS of SurMat for a research grant. B. Schüpbach and A. Terfort

Efficient electron-induced removal of oxalate ions and formation of copper nanoparticles from copper(II) oxalate precursor layers

• Kai Rückriem,
• Sarah Grotheer,
• Henning Vieker,
• Paul Penner,
• André Beyer,
• Armin Gölzhäuser and
• Petra Swiderek

Beilstein J. Nanotechnol. 2016, 7, 852–861, doi:10.3762/bjnano.7.77

• the corresponding SurMOF making it an apparently interesting precursor material. However, the NPs produced by exposing HKUST-1 to electrons were embedded in an ill-defined carbon matrix [18] calling again for further purification steps. The aim of the present study was to demonstrate that copper(II

Site-selective growth of surface-anchored metal-organic frameworks on self-assembled monolayer patterns prepared by AFM nanografting

• Tatjana Ladnorg,
• Alexander Welle,
• Stefan Heißler,
• Christof Wöll and
• Hartmut Gliemann

Beilstein J. Nanotechnol. 2013, 4, 638–648, doi:10.3762/bjnano.4.71

• the orientation of the SURMOF. Here, we demonstrate for the first time the site-selective growth of the SURMOF HKUST-1 on thiol-based self-assembled monolayers patterned by the nanografting technique, with an atomic force microscope as a structuring tool. Two different approaches were applied: The

• growth of the SURMOF is observed. In the latter case the roughness of the HKUST-1 is found to be significantly higher than for the 1-mercaptopropionic acid. The successful grafting process was verified by time-of-flight secondary ion mass spectrometry and atomic force microscopy. The SURMOF structures

• grown via LPE were investigated and characterized by atomic force microscopy and Fourier-transform infrared microscopy. Keywords: atomic force microscopy (AFM); metal-organic frameworks; nanografting; nanoshaving; SURMOF; Introduction Metal organic frameworks (MOFs) are highly crystalline three

The oriented and patterned growth of fluorescent metal–organic frameworks onto functionalized surfaces

• Jinliang Zhuang,
• Jasmin Friedel and
• Andreas Terfort

Beilstein J. Nanotechnol. 2012, 3, 570–578, doi:10.3762/bjnano.3.66

• lithography, the lateral distribution of the functional groups could be determined in such a way that the highly localized deposition of the SURMOF films became possible. Keywords: electron-beam lithography; irradiation-promoted exchange reaction; microcontact printing; radiation-induced nanostructure; self

• observed, which can be assigned to the reflections of the (110) and (220) planes according to the powder XRD pattern of [Zn2(adc)2(dabco)]. The [110] orientation of the SURMOF is in agreement with the expectation deducible from the crystal structure: The surface carboxylate groups replace, e.g., the

• leftmost carboxyl groups in Figure 1a, directing the (110) plane (blue) parallel to the substrate surface. In contrast, the growth of [Zn2(adc)2(dabco)] on a SAM with monodentate Lewis base headgroups capable of coordinating to the apical sites of the Zn2 units should lead to a [001] orientated SURMOF, in