Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning

• Chang-Ming Wang,
• Hong-Sheng Chan,
• Chia-Li Liao,
• Che-Wei Chang and
• Wei-Ssu Liao

Beilstein J. Nanotechnol. 2023, 14, 34–44, doi:10.3762/bjnano.14.4

• limit of commercially available techniques down to the 10 nm scale in the form of extreme ultraviolet lithography [1][2], though equipment cost and energy consumption substantially increase with smaller desired feature dimension. On the contrary, direct-write methods like electron beam lithography can

Effects of focused electron beam irradiation parameters on direct nanostructure formation on Ag surfaces

• Jānis Sniķeris,
• Vjačeslavs Gerbreders,
• Andrejs Bulanovs and
• Ēriks Sļedevskis

Beilstein J. Nanotechnol. 2022, 13, 1004–1010, doi:10.3762/bjnano.13.87

• nanopatterning of metal surfaces, but it is a complicated and expensive multistep process [8]. Electron beam induced deposition (EBID) is a direct-write lithography technique, which is capable of creating 2D and free-standing 3D nanostructures by using electron irradiation to dissociate volatile precursor

Optimizing PMMA solutions to suppress contamination in the transfer of CVD graphene for batch production

• Chun-Da Liao,
• Andrea Capasso,
• Tiago Queirós,
• Telma Domingues,
• Fatima Cerqueira,
• Nicoleta Nicoara,
• Jérôme Borme,
• Paulo Freitas and
• Pedro Alpuim

Beilstein J. Nanotechnol. 2022, 13, 796–806, doi:10.3762/bjnano.13.70

• : C4 PMMA; Wafer 2: B2 PMMA). Both wafers started with the patterning of Cr/Au contacts (deposited by magnetron sputtering) using direct-write laser lithography and ion milling. The fabrication of the two wafers followed slightly different steps, as described below. Wafer 1: A stopping layer (Al2O3

Irradiation-driven molecular dynamics simulation of the FEBID process for Pt(PF₃)₄

• Alexey Prosvetov,
• Alexey V. Verkhovtsev,
• Gennady Sushko and
• Andrey V. Solov’yov

Beilstein J. Nanotechnol. 2021, 12, 1151–1172, doi:10.3762/bjnano.12.86

• adjusted to simulate the nanostructure formation by other nanofabrication techniques using electron beams, such as direct-write EBL [3]. In the following section, all steps of the protocol shown in Figure 1 are described in detail, going from the system specification (step 1) to the multi-cycle simulation

A review of defect engineering, ion implantation, and nanofabrication using the helium ion microscope

• Frances I. Allen

Beilstein J. Nanotechnol. 2021, 12, 633–664, doi:10.3762/bjnano.12.52

• following, the field of materials modification research using the HIM is reviewed, subdivided into the following areas: 1. defect engineering, 2. ion implantation, 3. irradiation-induced restructuring, 4. resist-based lithography, 5. direct-write lithography/milling (including gas-assisted milling), and 6

• irradiating just one side of a portion of WSe2 bridging two metal contacts to create semiconducting (pristine) and insulating (irradiated) halves contacted by the source and drain electrodes (Figure 2b). Direct-write of further logic circuits into single flakes of WSe2 and WS2 has also been demonstrated [26

• electronic conduction properties of the material without needing to rely on thermal activation [37]. And finally in the category of electronic applications, a number of studies have used the HIM to direct-write Josephson tunnel junctions into thin films of high-transition-temperature superconductors. This

Exploring the fabrication and transfer mechanism of metallic nanostructures on carbon nanomembranes via focused electron beam induced processing

• Christian Preischl,
• Linh Hoang Le,
• Elif Bilgilisoy,
• Armin Gölzhäuser and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2021, 12, 319–329, doi:10.3762/bjnano.12.26

• agent need to be considered and further studied. Keywords: 2D materials; carbon nanomembranes (CNMs); focused electron beam-induced processing; metallic nanostructures; self-assembled monolayers; Introduction Focused electron beam-induced processing (FEBIP) is a powerful maskless “direct-write

Gold(I) N-heterocyclic carbene precursors for focused electron beam-induced deposition

• Cristiano Glessi,
• Aya Mahgoub,
• Cornelis W. Hagen and
• Mats Tilset

Beilstein J. Nanotechnol. 2021, 12, 257–269, doi:10.3762/bjnano.12.21

• ][15] and biomedical applications [16]. FEBID provides a flexible direct-write technique to fabricate complex 3D structures, which are hard to realize using resist-based planar lithography processes. However, when using organometallic precursors, usually, undesired dissociation fragments also end up in

Electron beam-induced deposition of platinum from Pt(CO)₂Cl₂ and Pt(CO)₂Br₂

• Aya Mahgoub,
• Hang Lu,
• Rachel M. Thorman,
• Konstantin Preradovic,
• Titel Jurca,
• Lisa McElwee-White,
• Howard Fairbrother and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2020, 11, 1789–1800, doi:10.3762/bjnano.11.161

• -dispersive X-ray spectroscopy (EDX); focused electron beam-induced deposition (FEBID); nanofabrication; platinum precursors; scanning electron microscopy (SEM); thermogravimetric analysis (TGA); Introduction Focused electron beam-induced deposition (FEBID) is a direct-write nanopatterning technique. FEBID

Charged particle single nanometre manufacturing

• Philip D. Prewett,
• Cornelis W. Hagen,
• Claudia Lenk,
• Steve Lenk,
• Marcus Kaestner,
• Tzvetan Ivanov,
• Ahmad Ahmad,
• Ivo W. Rangelow,
• Xiaoqing Shi,
• Stuart A. Boden,
• Alex P. G. Robinson,
• Dongxu Yang,
• Sangeetha Hari,
• Marijke Scotuzzi and
• Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

• ). 2.2.2 Focused electron beam induced processing. Focused electron beam induced processing (FEBIP) is a high-resolution direct-write nanopatterning method comprising two complementary techniques, namely electron beam induced deposition (EBID) and etching (EBIE). The advantages of FEBIP lie not only in the

• in the presence of a chloride-containing precursor. Remarkably, the nanorods do not contain the precursor material but are instead formed from the substrate material. 2.2.2.2 Electron beam induced etching. Focused electron beam induced etching is another direct-write technique used for high

• nanopatterning technique. 2.2.2.3 EBID and large-area applications. From the previous section it is clear that EBID is a proven high-resolution direct-write lithography technique. However, for large area manufacturing, as targeted in the SNM project, one would prefer better control over the composition of the

Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition

• Lukas Keller and
• Michael Huth

Beilstein J. Nanotechnol. 2018, 9, 2581–2598, doi:10.3762/bjnano.9.240

High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

• Kahraman Keskinbora,
• Umut Tunca Sanli,
• Margarita Baluktsian,
• Corinne Grévent,
• Markus Weigand and
• Gisela Schütz

Beilstein J. Nanotechnol. 2018, 9, 2049–2056, doi:10.3762/bjnano.9.194

• are often the best choice for high-resolution, high-energy beam focusing applications such as scanning transmission X-ray microscopy [3], EUV lithography (EUVL) mask inspection [4][5][6][7] and direct-write EUVL [8][9], and soft and even hard X-ray lithography [10]. When fabricated to tight tolerances

• is direct-write ion beam lithography (IBL) and machining [32][33][34]. A well-known advantage of IBL is the ease of rapid prototyping of small-scale microfluidic, optical or electronic nanodevices. IBL has recently been applied for fabricating high-resolution functional FZPs [28][35][36] and for the

• successful realization of axially symmetric kinoform X-ray lenses via a gray-scale direct-write IBL approach [37]. In this work, we further demonstrate the improvements to our single-step writing of high-resolution FZPs via IBL. The means of improvements both in fabrication time and resolution by following a

Chemistry for electron-induced nanofabrication

• Petra Swiderek,
• Hubertus Marbach and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2018, 9, 1317–1320, doi:10.3762/bjnano.9.124

• beams can be used to induce, on a very small area, chemical reactions of adsorbed precursor molecules that either lead to etching of the underlying surface or deposition of material. The latter additive variant of FEBIP is focused electron beam induced deposition (FEBID), a powerful direct-write

Magnetic characterization of cobalt nanowires and square nanorings fabricated by focused electron beam induced deposition

• Federico Venturi,
• Gian Carlo Gazzadi,
• Amir H. Tavabi,
• Alberto Rota,
• Rafal E. Dunin-Borkowski and
• Stefano Frabboni

Beilstein J. Nanotechnol. 2018, 9, 1040–1049, doi:10.3762/bjnano.9.97

• focused electron beam induced deposition (FEBID) of Co carbonyl (Co2(CO)8). This is a direct-write technique performed in a scanning electron microscope (SEM) equipped with a gas injector system (GIS) [9]. It exploits secondary electron emission resulting from interaction of the primary electron beam with

Towards the third dimension in direct electron beam writing of silver

• Katja Höflich,
• Jakub Mateusz Jurczyk,
• Katarzyna Madajska,
• Maximilian Götz,
• Luisa Berger,
• Carlos Guerra-Nuñez,
• Caspar Haverkamp,
• Iwona Szymanska and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 842–849, doi:10.3762/bjnano.9.78

• direct-write technique that allows for a highly precise fabrication of three-dimensional nanostructures [1][2]. Gaseous precursor molecules are injected into the vacuum chamber of a scanning electron microscope and are locally dissociated by a focused electron beam [3]. After dissociation, the non

Electron interactions with the heteronuclear carbonyl precursor H₂FeRu₃(CO)₁₃ and comparison with HFeCo₃(CO)₁₂: from fundamental gas phase and surface science studies to focused electron beam induced deposition

• Ragesh Kumar T P,
• Paul Weirich,
• Lukas Hrachowina,
• Marc Hanefeld,
• Ragnar Bjornsson,
• Helgi Rafn Hrodmarsson,
• Sven Barth,
• D. Howard Fairbrother,
• Michael Huth and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53

• ; focused electron beam induced deposition; heteronuclear FEBID precursors; surface science; Introduction Direct-write technologies using electron beams for nanostructure deposition can surpass the limitations of standard lithography techniques, such as the growth of three-dimensional nanostructures with

Gas-assisted silver deposition with a focused electron beam

• Luisa Berger,
• Katarzyna Madajska,
• Iwona B. Szymanska,
• Katja Höflich,
• Mikhail N. Polyakov,
• Jakub Jurczyk,
• Carlos Guerra-Nuñez and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 224–232, doi:10.3762/bjnano.9.24

• Physics and Applied Computer Science, Al. Mickiewicza 30, 30-059 Kraków, Poland 10.3762/bjnano.9.24 Abstract Focused electron beam induced deposition (FEBID) is a flexible direct-write method to obtain defined structures with a high lateral resolution. In order to use this technique in application fields

• and preferably as few processing steps as possible. Therefore, a maskless direct-write method would be favorable in comparison to common resist-based lithography techniques, which require multiple steps and are reaching their lateral resolution limits. Focused electron beam induced deposition (FEBID

Design of photonic microcavities in hexagonal boron nitride

• Sejeong Kim,
• Milos Toth and
• Igor Aharonovich

Beilstein J. Nanotechnol. 2018, 9, 102–108, doi:10.3762/bjnano.9.12

• spectral range, which overlap with the ZPLs of SPEs in hBN [24]. We further optimize the structures and model 1D nanobeam photonic crystals that exhibit a Q-factor in excess of ≈20,000. In the light of recent progress in direct-write etching of hBN [25], our results are promising for realization of high Q

Comparative study of post-growth annealing of Cu(hfac)₂, Co₂(CO)₈ and Me₂Au(acac) metal precursors deposited by FEBID

• Marcos V. Puydinger dos Santos,
• Aleksandra Szkudlarek,
• Artur Rydosz,
• Carlos Guerra-Nuñez,
• Fanny Béron,
• Kleber R. Pirota,
• Stanislav Moshkalev,
• José Alexandre Diniz and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 91–101, doi:10.3762/bjnano.9.11

• storage, ferroelectric tunnel junction memristors, metal interconnects for high performance integrated circuits in microelectronics and nano-optics applications, especially in the areas of plasmonics and metamaterials. Focused-electron-beam-induced deposition (FEBID) is a maskless direct-write tool

• -established maskless nanopattering technique. It is based on the local dissociation of adsorbates upon the irradiation with electrons, combining the advantages of a direct-write process with the depositing possibility of a number of geometries at nanometric scale [1][2][3][4][5][6][7][8][9][10][11]. The

• metals, makes its localised direct-write deposition attractive for applications in high-performance integrated circuits and nanoelectronics [13][27]. Similarly, Au nanostructures are promising materials in nanoplasmonics, biomedical applications, electrochemical sensing, as well as contacts for carbon

Electron-driven and thermal chemistry during water-assisted purification of platinum nanomaterials generated by electron beam induced deposition

• Ziyan Warneke,
• Markus Rohdenburg,
• Jonas Warneke,
• Janina Kopyra and
• Petra Swiderek

Beilstein J. Nanotechnol. 2018, 9, 77–90, doi:10.3762/bjnano.9.10

• Division, Richland, WA, USA Siedlce University, Faculty of Sciences, 4 Maja 54, 08-110 Siedlce, Poland 10.3762/bjnano.9.10 Abstract Focused electron beam induced deposition (FEBID) is a versatile tool for the direct-write fabrication of nanostructures on surfaces. However, FEBID nanostructures are usually

The rational design of a Au(I) precursor for focused electron beam induced deposition

• Ali Marashdeh,
• Thiadrik Tiesma,
• Niels J. C. van Velzen,
• Sjoerd Harder,
• Remco W. A. Havenith,
• Jeff T. M. De Hosson and
• Willem F. van Dorp

Beilstein J. Nanotechnol. 2017, 8, 2753–2765, doi:10.3762/bjnano.8.274

• , University of Ghent, B-9000 Ghent, Belgium Uniresearch B.V., 2628 XG Delft, Netherlands 10.3762/bjnano.8.274 Abstract Au(I) complexes are studied as precursors for focused electron beam induced processing (FEBIP). FEBIP is an advanced direct-write technique for nanometer-scale chemical synthesis. The

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

• Domagoj Belić,
• Mostafa M. Shawrav,
• Emmerich Bertagnolli and
• Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

• microstructures can be fabricated by one-step direct-write lithography process using focused electron beam induced deposition (FEBID). Typically, as-deposited gold nanostructures suffer from a low Au content and unacceptably high carbon contamination. We show that the undesirable carbon contamination can be

• direct writing of purer gold nanostructures that can enable their future use for demanding applications. Keywords: FEBID; gold nanostructures; oxygen plasma; postdeposition purification; Introduction Focused electron beam induced deposition (FEBID) is an additive direct-write method for making complex

Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition

• Julie A. Spencer,
• Michael Barclay,
• Miranda J. Gallagher,
• Robert Winkler,
• Ilyas Unlu,
• Yung-Chien Wu,
• Harald Plank,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240

• nanostructures to be fabricated. Despite the significant advantages of a process that can direct write nanostructures without the need for resists or masks [2][3], FEBID has several challenges preventing its wider implementation as a robust method for nanofabrication. One of the biggest issues is deposit purity

Dissociative electron attachment to coordination complexes of chromium: chromium(0) hexacarbonyl and benzene-chromium(0) tricarbonyl

• Janina Kopyra,
• Paulina Maciejewska and
• Jelena Maljković

Beilstein J. Nanotechnol. 2017, 8, 2257–2263, doi:10.3762/bjnano.8.225

• fabricate three-dimensional metal-containing nanoscale structures [4][5]. FEBID is a direct-write technique in which a highly focused, high-energy electron beam impinges on precursor molecules physisorbed onto a substrate, thereby causing their dissociation, and in the ideal case, leading to pure deposit

Modelling focused electron beam induced deposition beyond Langmuir adsorption

• Dédalo Sanz-Hernández and
• Amalio Fernández-Pacheco

Beilstein J. Nanotechnol. 2017, 8, 2151–2161, doi:10.3762/bjnano.8.214

• deposition; 3D nanoprinting; Langmuir model; Introduction Focused electron beam induced deposition (FEBID) is a direct-write nanolithography technique, based on the local decomposition of gas molecules adsorbed on a substrate and induced by the interaction with a focused beam of electrons [1][2][3]. FEBID

3D Nanoprinting via laser-assisted electron beam induced deposition: growth kinetics, enhanced purity, and electrical resistivity

• Brett B. Lewis,
• Robert Winkler,
• Xiahan Sang,
• Pushpa R. Pudasaini,
• Michael G. Stanford,
• Harald Plank,
• Raymond R. Unocic,
• Jason D. Fowlkes and
• Philip D. Rack

Beilstein J. Nanotechnol. 2017, 8, 801–812, doi:10.3762/bjnano.8.83

• : additive manufacturing; beam induced processing; 3D printing; direct-write; electron beam induced deposition; microscopy; nanofabrication; pulsed laser; purification; rapid prototyping; Introduction The first fully incorporated 3D transistor logic was reported in 2012 [1]. Further 3D device concepts and