Beilstein J. Nanotechnol.2015,6, 976–986, doi:10.3762/bjnano.6.101
production of polymer nanopatterns with controllable geometrical parameters by means of a single-spot electron-beam lithography technique. The essence of the method entails the overexposure of a positive-tone resist, spin-coated onto a substrate where nanoscale spots are exposed to an electron beam with a
silicon substrates, gold-coated substrates can also successfully be used for the single-spot nanopattering technique. An explanation of the results related to the resist overexposure was demonstrated using Monte Carlo simulations. Our nanofabrication method significantly accelerates (up to 10 times) the
lithography; exposure dose; high-resolution lithography; nanomagnets; nanostructure; overexposure; PMMA; polymer; resist carbonization; Introduction
The continuous growth of the nanotechnology and microelectronic industries requires the development of new approaches and methods for the formation of nanoscale
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Figure 1:
SEM images demonstrating the effect of substrate on the single-spot overexposure of a ring at a dos...
Beilstein J. Nanotechnol.2011,2, 845–861, doi:10.3762/bjnano.2.94
sensitive to overexposure, and that in terms of contrast, the best resolution that can be achieved with photocatalytic patterning is expected to be no better than a few microns. Moreover, if one accepts the notion that the dominant mechanism of remote degradation is photoinduced homolysis of
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Figure 1:
Schematic representation of binding modes between phosphonic acid SAMs and titanium dioxide (1) mon...