Advancing nanolithography: a comprehensive review of materials for local anodic oxidation with AFM

• Matteo Lorenzoni

Beilstein J. Nanotechnol. 2026, 17, 275–291, doi:10.3762/bjnano.17.19

• the oxide features are governed mainly by the applied voltage, pulse duration, and tip movement speed. This controlled oxidation process is highly effective for fabricating high-resolution patterns, with numerous examples demonstrating the successful creation of silicon oxide nanostructures featuring

Selective surface modification of lithographic silicon oxide nanostructures by organofunctional silanes

• Thomas Baumgärtel,
• Christian von Borczyskowski and
• Harald Graaf

Beilstein J. Nanotechnol. 2013, 4, 218–226, doi:10.3762/bjnano.4.22

• functionalization of silicon oxide nanostructures prepared by AFM-anodization lithography of alkyl-terminated silicon. Different conditions for the growth of covalently bound mono-, multi- or submonolayers of distinctively functional silane molecules on nanostructures have been identified by AFM-height

• investigations. Routes for the preparation of methyl- or amino-terminated structures or silicon surfaces are presented and discussed. The formation of silane monolayers on nanoscopic silicon oxide nanostructures was found to be much more sensitive towards ambient humidity than, e.g., the silanization of larger

• coverage of the dye molecules on length scale that is not accessible by standard AFM measurements. Keywords: AFM lithography; amino-functionalization; local anodic oxidation; octadecyl-trichlorosilane; silicon oxide nanostructures; Introduction Local anodic oxidation (LAO) nanolithography is a reliable