Radiation-induced nanostructures: Formation processes and applications

  1. editorImage
  1. Editor: Prof. Michael Huth
    Goethe Universität Frankfurt am Main

Radiation-induced nanostructure formation is ubiquitous. It is routinely used in lithography employing photons and masks, or in the form of focused electron beams following a maskless approach for pattern definition in a radiation-sensitive resist, also commonly known as electron beam lithography. Examples of this are found in this Thematic Series covering the topics of selected-area silicon nanowire growth by the vapor–liquid–solid approach and the preparation of monolayers of metal–organic frameworks attached to the functional groups of a self-assembled monolayer. Not as wide-spread, but rapidly developing, is the technique of focused electron beam induced deposition. In this technique a previously adsorbed molecular precursor is dissociated by the electron beam, leaving behind a permanent deposit of an amorphous, nanogranular or polycrystalline microstructure with a minimum feature size well below 10 nm. Selected aspects of this technique and its application are reviewed in this Thematic Series.

  • Editorial
  • Published 25 Jul 2012

Beilstein J. Nanotechnol. 2012, 3, 533–534, doi:10.3762/bjnano.3.61

Directed deposition of silicon nanowires using neopentasilane as precursor and gold as catalyst

  1. Britta Kämpken,
  2. Verena Wulf,
  3. Norbert Auner,
  4. Marcel Winhold,
  5. Michael Huth,
  6. Daniel Rhinow and
  7. Andreas Terfort
  • Full Research Paper
  • Published 25 Jul 2012

  • PDF

Beilstein J. Nanotechnol. 2012, 3, 535–545, doi:10.3762/bjnano.3.62

Spontaneous dissociation of Co2(CO)8 and autocatalytic growth of Co on SiO2: A combined experimental and theoretical investigation

  1. Kaliappan Muthukumar,
  2. Harald O. Jeschke,
  3. Roser Valentí,
  4. Evgeniya Begun,
  5. Johannes Schwenk,
  6. Fabrizio Porrati and
  7. Michael Huth
  • Full Research Paper
  • Published 25 Jul 2012

  • PDF

Beilstein J. Nanotechnol. 2012, 3, 546–555, doi:10.3762/bjnano.3.63

Nanolesions induced by heavy ions in human tissues: Experimental and theoretical studies

  1. Marcus Bleicher,
  2. Lucas Burigo,
  3. Marco Durante,
  4. Maren Herrlitz,
  5. Michael Krämer,
  6. Igor Mishustin,
  7. Iris Müller,
  8. Francesco Natale,
  9. Igor Pshenichnov,
  10. Stefan Schramm,
  11. Gisela Taucher-Scholz and
  12. Cathrin Wälzlein
  • Full Research Paper
  • Published 25 Jul 2012

  • PDF

  • Supp. Info

Beilstein J. Nanotechnol. 2012, 3, 556–563, doi:10.3762/bjnano.3.64

Synthesis and electrical characterization of intrinsic and in situ doped Si nanowires using a novel precursor

  1. Wolfgang Molnar,
  2. Alois Lugstein,
  3. Tomasz Wojcik,
  4. Peter Pongratz,
  5. Norbert Auner,
  6. Christian Bauch and
  7. Emmerich Bertagnolli
  • Full Research Paper
  • Published 31 Jul 2012

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Beilstein J. Nanotechnol. 2012, 3, 564–569, doi:10.3762/bjnano.3.65

  • Full Research Paper
  • Published 02 Aug 2012

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Beilstein J. Nanotechnol. 2012, 3, 570–578, doi:10.3762/bjnano.3.66

Focused electron beam induced deposition: A perspective

  1. Michael Huth,
  2. Fabrizio Porrati,
  3. Christian Schwalb,
  4. Marcel Winhold,
  5. Roland Sachser,
  6. Maja Dukic,
  7. Jonathan Adams and
  8. Georg Fantner
  • Review
  • Published 29 Aug 2012

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  • Video

Beilstein J. Nanotechnol. 2012, 3, 597–619, doi:10.3762/bjnano.3.70

  • Review
  • Published 17 Dec 2012

  • PDF

Beilstein J. Nanotechnol. 2012, 3, 860–883, doi:10.3762/bjnano.3.97

  • Full Research Paper
  • Published 04 Feb 2013

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  • Supp. Info

Beilstein J. Nanotechnol. 2013, 4, 77–86, doi:10.3762/bjnano.4.9

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