Energy conversion applications of atomic layer deposition

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Editor: Prof. Julien Bachmann
Friedrich Alexander Universität Erlangen-Nürnberg
 
Any method capable of depositing thin functional layers onto structured substrates, and especially into nanoporous frameworks, is conferred with a direct relevance towards energy conversion applications. The conformal coating of non-planar samples is a property that uniquely defines atomic layer deposition (ALD), which is why ALD is inherently suited to the preparation of energy conversion devices. ALD achieves a thin film growth by using well-defined surface chemistry. Two or more complementary, quantitative surface reactions performed subsequently and repeated in an alternating manner result in the deposition of a solid in a layer-by-layer fashion. This Thematic Series will certainly provide the reader with novel ideas for exploiting ALD in the energy realm, and spur further original work in this rapidly developing research area. After its industrial application in electroluminescent displays, semiconductor logics, magnetic and semiconductor memory, ALD has the potential to also become a critical tool in the area of energy conversion.
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Atomic layer deposition, a unique method for the preparation of energy conversion devices

  • Julien Bachmann

Beilstein J. Nanotechnol. 2014, 5, 245–248, doi:10.3762/bjnano.5.26

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Published 05 Mar 2014

Preparation of electrochemically active silicon nanotubes in highly ordered arrays

  • Tobias Grünzel,
  • Young Joo Lee,
  • Karsten Kuepper and
  • Julien Bachmann

Beilstein J. Nanotechnol. 2013, 4, 655–664, doi:10.3762/bjnano.4.73

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Published 16 Oct 2013

Evolution of microstructure and related optical properties of ZnO grown by atomic layer deposition

  • Adib Abou Chaaya,
  • Roman Viter,
  • Mikhael Bechelany,
  • Zanda Alute,
  • Donats Erts,
  • Anastasiya Zalesskaya,
  • Kristaps Kovalevskis,
  • Vincent Rouessac,
  • Valentyn Smyntyna and
  • Philippe Miele

Beilstein J. Nanotechnol. 2013, 4, 690–698, doi:10.3762/bjnano.4.78

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Published 28 Oct 2013

Surface passivation and optical characterization of Al2O3/a-SiCx stacks on c-Si substrates

  • Gema López,
  • Pablo R. Ortega,
  • Cristóbal Voz,
  • Isidro Martín,
  • Mónica Colina,
  • Anna B. Morales,
  • Albert Orpella and
  • Ramón Alcubilla

Beilstein J. Nanotechnol. 2013, 4, 726–731, doi:10.3762/bjnano.4.82

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Published 06 Nov 2013

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

  • Jörg Haeberle,
  • Karsten Henkel,
  • Hassan Gargouri,
  • Franziska Naumann,
  • Bernd Gruska,
  • Michael Arens,
  • Massimo Tallarida and
  • Dieter Schmeißer

Beilstein J. Nanotechnol. 2013, 4, 732–742, doi:10.3762/bjnano.4.83

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Published 08 Nov 2013

Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement

  • Cathy Bugot,
  • Nathanaëlle Schneider,
  • Daniel Lincot and
  • Frédérique Donsanti

Beilstein J. Nanotechnol. 2013, 4, 750–757, doi:10.3762/bjnano.4.85

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Published 13 Nov 2013

Quantum size effects in TiO2 thin films grown by atomic layer deposition

  • Massimo Tallarida,
  • Chittaranjan Das and
  • Dieter Schmeisser

Beilstein J. Nanotechnol. 2014, 5, 77–82, doi:10.3762/bjnano.5.7

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Published 22 Jan 2014

3D-nanoarchitectured Pd/Ni catalysts prepared by atomic layer deposition for the electrooxidation of formic acid

  • Loïc Assaud,
  • Evans Monyoncho,
  • Kristina Pitzschel,
  • Anis Allagui,
  • Matthieu Petit,
  • Margrit Hanbücken,
  • Elena A. Baranova and
  • Lionel Santinacci

Beilstein J. Nanotechnol. 2014, 5, 162–172, doi:10.3762/bjnano.5.16

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Published 12 Feb 2014

Photovoltaic properties of ZnO nanorods/p-type Si heterojunction structures

  • Rafal Pietruszka,
  • Bartlomiej S. Witkowski,
  • Grzegorz Luka,
  • Lukasz Wachnicki,
  • Sylwia Gieraltowska,
  • Krzysztof Kopalko,
  • Eunika Zielony,
  • Piotr Bieganski,
  • Ewa Placzek-Popko and
  • Marek Godlewski

Beilstein J. Nanotechnol. 2014, 5, 173–179, doi:10.3762/bjnano.5.17

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Published 14 Feb 2014

Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes

  • Nuri Yazdani,
  • Vipin Chawla,
  • Eve Edwards,
  • Vanessa Wood,
  • Hyung Gyu Park and
  • Ivo Utke

Beilstein J. Nanotechnol. 2014, 5, 234–244, doi:10.3762/bjnano.5.25

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Published 05 Mar 2014
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