2 article(s) from Gudmundsson, Jón Tómas
Figure 1: (a) Film density, (b) deposition rate, and (c) surface roughness of nickel films deposited by HiPIM...
Figure 2: The measured (red solid) and simulated (blue dot) XRR data of HiPIMS and dcMS deposited Ni films un...
Figure 3: GiXRD pattern of the nickel film deposited by dcMS, conventional position, at 0.6 Pa, and 150 W pow...
Figure 4: Cross-sectional SEM image of nickel films that were deposited by (a) HiPIMS, and (b) dcMS at 70° su...
Figure 5: MOKE loops of nickel films that were deposited by (a–e) HiPIMS and (f–j) dcMS, at various tilt angl...
Figure 6: The Hc and Hk (for samples with uniaxial anisotropy) of our nickel films measured using MOKE with t...
Figure 1: (a) GiXRD diffractograms of MLs annealed from 550–900 °C along with the as-grown MLs. The SiGe crys...
Figure 2: GIXRD diffractogram (upper part) with zoomed-in view (lower part) of crystallographic plane (111) o...
Figure 3: XRR plot for as-deposited and annealed (for 1 min) structures. The vertical dashed lines illustrate...
Figure 4: XTEM images of (a) MLs with 20 nm SiGe layer after 600 °C annealing for 1 min, (b) SAED pattern tak...
Figure 5: (a) XTEM image of MLs annealed at 600 °C (1 min) showing columnar morphology of SiGe NCs in the fil...
Figure 6: (a) TEM low-magnification image showing the contrast due to the shearing defects appearing in the S...
Figure 7: (a) Deconvoluted (Gaussian fit) room-temperature photocurrent spectra of as-grown MLs. (b) Normaliz...