TY - JOUR A1 - Naghshine, Babak B. A1 - Kiani, Amirkianoosh T1 - Laser processing of thin-film multilayer structures: comparison between a 3D thermal model and experimental results JF - Beilstein Journal of Nanotechnology PY - 2017/// VL - 8 SP - 1749 EP - 1759 SN - 2190-4286 DO - 10.3762/bjnano.8.176 PB - Beilstein-Institut JA - Beilstein J. Nanotechnol. UR - https://doi.org/10.3762/bjnano.8.176 KW - 3D transient modelling KW - heat transfer KW - laser materials processing KW - nanosecond pulses KW - silicon KW - thin-film N2 - In this research, a numerical model is introduced for simulation of laser processing of thin film multilayer structures, to predict the temperature and ablated area for a set of laser parameters including average power and repetition rate. Different thin-films on Si substrate were processed by nanosecond Nd:YAG laser pulses and the experimental and numerical results were compared to each other. The results show that applying a thin film on the surface can completely change the temperature field and vary the shape of the heat affected zone. The findings of this paper can have many potential applications including patterning the cell growth for biomedical applications and controlling the grain size in fabrication of polycrystalline silicon (poly-Si) thin-film transistors (TFTs). ER -