TY - JOUR A1 - Chiriaev, Serguei A1 - Tavares, Luciana A1 - Adashkevich, Vadzim A1 - Goszczak, Arkadiusz J. A1 - Rubahn, Horst-Günter T1 - Out-of-plane surface patterning by subsurface processing of polymer substrates with focused ion beams JF - Beilstein Journal of Nanotechnology PY - 2020/// VL - 11 SP - 1693 EP - 1703 SN - 2190-4286 DO - 10.3762/bjnano.11.151 PB - Beilstein-Institut JA - Beilstein J. Nanotechnol. UR - https://doi.org/10.3762/bjnano.11.151 KW - direct patterning KW - focused helium ion beam KW - out-of-plane nanopatterning KW - polymers KW - thin films N2 - This work explores a new technique for the out-of-plane patterning of metal thin films prefabricated on the surface of a polymer substrate. This technique is based on an ion-beam-induced material modification in the bulk of the polymer. Effects of subsurface and surface processes on the surface morphology have been studied for three polymer materials: poly(methyl methacrylate), polycarbonate, and polydimethylsiloxane, by using focused ion beam irradiation with He+, Ne+, and Ga+. Thin films of a Pt60Pd40 alloy and of pristine Au were used to compare the patterning of thin films with different microstructures. We show that the height of Pt60Pd40 thin films deposited onto poly(methyl methacrylate) and polycarbonate substrates can be patterned by He+ ion beams with ultrahigh precision (nanometers) while preserving in-plane features, at the nanoscale, of the pre-deposited films. Ion irradiation of the Au-coated samples results in delamination, bulging, and perforation of the Au film, which is attributed to the accumulation of gases from radiolysis at the film–substrate interface. The irradiation with Ne+ and Ga+ ions destroys the films and roughens the surface due to dominating sputtering processes. A very different behavior, resulting in the formation of complex, multiscale 3D patterns, is observed for polydimethylsiloxane samples. The roles of the metal film structure, elastic properties of the polymer substrate, and irradiation-induced mechanical strain in the patterning process are elaborated and discussed. ER - TY - BOOK T1 - Focused Ion Beam Systems PY - 2007/// DO - 10.1017/cbo9780511600302 PB - Cambridge University Press CY - Cambridge, United Kingdom A2 - Yao, N. ER - TY - BOOK AU - Joy, D. C. T1 - Helium Ion Microscopy - Principles and Applications PY - 2013/// DO - 10.1007/978-1-4614-8660-2 PB - Springer CY - New York, U.S.A. ER - TY - CHAP AU - Shorubalko, I. AU - Pillatsch, L. AU - Utke, I. T2 - Direct–Write Milling and Deposition with Noble Gases T1 - Helium Ion Microscopy PY - 2016/// SP - 355 EP - 393 DO - 10.1007/978-3-319-41990-9_15 PB - Springer International Publishing CY - Cham, Switzerland A2 - Hlawacek, G. A2 - Gölzhäuser, A. ER - TY - JOUR AU - Tavares, L. 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