Sidewall angle tuning in focused electron beam-induced processing

• Sangeetha Hari,
• Willem F. van Dorp,
• Johannes J. L. Mulders,
• Piet H. F. Trompenaars,
• Pieter Kruit and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 447–456, doi:10.3762/bjnano.15.40

• coloured curves going from blue to orange. (a) Top view SE image of the array of EBID deposits along with the etching scheme: The array of etch patterns was aligned with the deposit array at increasing distance from the deposit centre from left to right. The nine deposits shown are to be etched and their

• bright-field mode in an FEG Tecnai 20 D239 S-Twin TEM using an acceleration voltage of 200 keV and spot 3. The EBID deposit is indicated in (a), and the white arrow shows the approximate position of the electron beam for EBIE. The successful creation of a vertical sidewall is visible in (f). Resulting

Effects of focused electron beam irradiation parameters on direct nanostructure formation on Ag surfaces

• Jānis Sniķeris,
• Vjačeslavs Gerbreders,
• Andrejs Bulanovs and
• Ēriks Sļedevskis

Beilstein J. Nanotechnol. 2022, 13, 1004–1010, doi:10.3762/bjnano.13.87

• nanopatterning of metal surfaces, but it is a complicated and expensive multistep process [8]. Electron beam induced deposition (EBID) is a direct-write lithography technique, which is capable of creating 2D and free-standing 3D nanostructures by using electron irradiation to dissociate volatile precursor

• molecules, whose products of dissociation are deposited on the irradiated area [9][10][11]. Normally, precursor molecules are intentionally delivered to the irradiated area by a gas flow. However, residual gases in the vacuum chamber can also be used as a precursor for EBID. Nanostructures produced from

• . However, some studies suggest that this process may not always be so simple. Ueda and Yoshimura [27] reported the fabrication of free-standing nanowires on various metal surfaces (Al, Ag, Au, Cu, Pt, Ta, Ti, and W) via EBID with pump oil (hydrocarbons) as a precursor. It was observed that the substrate

Exploring the fabrication and transfer mechanism of metallic nanostructures on carbon nanomembranes via focused electron beam induced processing

• Christian Preischl,
• Linh Hoang Le,
• Elif Bilgilisoy,
• Armin Gölzhäuser and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2021, 12, 319–329, doi:10.3762/bjnano.12.26

• electron beam-induced processing is a versatile method for the fabrication of metallic nanostructures with arbitrary shape, in particular, on top of two-dimensional (2D) organic materials, such as self-assembled monolayers (SAMs). Two methods, namely electron beam-induced deposition (EBID) and electron

• beam-induced surface activation (EBISA) are studied with the precursors Fe(CO)5 and Co(CO)3NO on SAMs of 1,1′,4′,1′′-terphenyl-4-thiol (TPT). For Co(CO)3NO only EBID leads to deposits consisting of cobalt oxide. In the case of Fe(CO)5 EBID and EBISA yield deposits consisting of iron nanocrystals with

• ” approach for the fabrication of arbitrarily shaped nanostructures [1][2][3][4][5]. The most prominent method within the FEBIP family is electron beam-induced deposition (EBID). In EBID, a focused electron beam is used to locally dissociate adsorbed precursor molecules. Thus, a localized deposit of the non

Charged particle single nanometre manufacturing

• Philip D. Prewett,
• Cornelis W. Hagen,
• Claudia Lenk,
• Steve Lenk,
• Marcus Kaestner,
• Tzvetan Ivanov,
• Ahmad Ahmad,
• Ivo W. Rangelow,
• Xiaoqing Shi,
• Stuart A. Boden,
• Alex P. G. Robinson,
• Dongxu Yang,
• Sangeetha Hari,
• Marijke Scotuzzi and
• Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

• , enabling multiproject wafers for chip-development purposes. The prototype multibeam tool at TU Delft has 196 electron beams and has been used as an electron beam deposition (EBID) writer. Negative tone pattern generation is achieved by electron beam decomposition of a gas precursor as shown schematically

• in Figure 10. EBID is a technique with a potentially higher spatial resolution than conventional resist-based EBL. The next section briefly reviews EBID and its counterpart electron beam induced etching (EBIE). The generic term for both techniques is focused electron beam induced processing (FEBIP

• ). 2.2.2 Focused electron beam induced processing. Focused electron beam induced processing (FEBIP) is a high-resolution direct-write nanopatterning method comprising two complementary techniques, namely electron beam induced deposition (EBID) and etching (EBIE). The advantages of FEBIP lie not only in the

Low cost tips for tip-enhanced Raman spectroscopy fabricated by two-step electrochemical etching of 125 µm diameter gold wires

• Antonino Foti,
• Francesco Barreca,
• Enza Fazio,
• Cristiano D’Andrea,
• Paolo Matteini,
• Onofrio Maria Maragò and
• Pietro Giuseppe Gucciardi

Beilstein J. Nanotechnol. 2018, 9, 2718–2729, doi:10.3762/bjnano.9.254

• deposition (EBID) and focused ion beam (FIB) milling [41][42][43] (see [30][44] for reviews). Fabrication methods capable of guaranteeing high reproducibility, cost-effectiveness and scalability to industrial production are, however, still not available at present. Metal vapor deposition on AFM tips is

Formation mechanisms of boron oxide films fabricated by large-area electron beam-induced deposition of trimethyl borate

• Aiden A. Martin and
• Philip J. Depond

Beilstein J. Nanotechnol. 2018, 9, 1282–1287, doi:10.3762/bjnano.9.120

• absorbers, and high-temperature and chemically resistant ceramics. In this article, the first investigation into the deposition of boron-based material via electron beam-induced deposition (EBID) is reported. Thin films were deposited using a novel, large-area EBID system that is shown to deposit material

• at rates comparable to conventional techniques such as laser-induced chemical vapor deposition. The deposition rate and stoichiometry of boron oxide fabricated by EBID using trimethyl borate (TMB) as precursor is found to be critically dependent on the substrate temperature. By comparing the

• deposition mechanisms of TMB to the conventional, alkoxide-based precursor tetraethyl orthosilicate it is revealed that ligand chemistry does not precisely predict the pathways leading to deposition of material via EBID. The results demonstrate the first boron-containing material deposited by the EBID

Dynamics and fragmentation mechanism of (C₅H₄CH₃)Pt(CH₃)₃ on SiO₂ surfaces

• Kaliappan Muthukumar,
• Harald O. Jeschke and
• Roser Valentí

Beilstein J. Nanotechnol. 2018, 9, 711–720, doi:10.3762/bjnano.9.66

• the initial orientation of the molecule and the distribution of surface active sites. Based on the observations from the simulations and available experiments, we discuss possible dissociation channels of the precursor. Keywords: deposition; dissociation; electron beam induced deposition (EBID

• ); focused electron beam induced deposition (FEBID); precursor; trimethyl(methylcyclopentadienyl)platinum(IV) ((CH3-C5H4)Pt(CH3)3); Introduction Nanoscale device applications require a growth of regular or specially patterned transition metal nanodeposits. Electron beam induced deposition (EBID), is a size

• incomplete dissociation of the precursor molecules on the substrate during the deposition process leaves a significant organic residue, thus impairing the quality of the deposits [3][6]. This lowers the range of applicability of EBID for nanotechnological applications. Several postfabrication approaches

Electron interaction with copper(II) carboxylate compounds

• Michal Lacko,
• Peter Papp,
• Iwona B. Szymańska,
• Edward Szłyk and
• Štefan Matejčík

Beilstein J. Nanotechnol. 2018, 9, 384–398, doi:10.3762/bjnano.9.38

• latter, reactive chemical species (radicals) and electrons lead to activation of molecules and this process can be controlled well on large scales. One of the most innovative techniques, known as EBID or FEBID (Focused Electron Beam Induced Deposition) [2][3], uses a high energy electron beam that can be

Localized growth of carbon nanotubes via lithographic fabrication of metallic deposits

• Fan Tu,
• Martin Drost,
• Imre Szenti,
• Janos Kiss,
• Zoltan Kónya and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2017, 8, 2592–2605, doi:10.3762/bjnano.8.260

• morphology, for example, as individual nanotubes or as CNT forests. Electron beam induced deposition (EBID) with subsequent autocatalytic growth (AG) was applied to lithographically produce catalytically active seeds for the localized growth of CNTs via chemical vapor deposition (CVD). With the precursor Fe

• (CO)5 we were able to fabricate clean iron deposits via EBID and AG. After the proof-of-principle that these Fe deposits indeed act as seeds for the growth of CNTs, the influence of significant EBID/AG parameters on the deposit shape and finally the yield and morphology of the grown CNTs was

• investigated in detail. Based on these results, the parameters could be optimized such that EBID point matrixes (6 × 6) were fabricated on a silica surface whereby at each predefined site only one CNT was produced. Furthermore, the localized fabrication of CNT forests was targeted and successfully achieved on

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

• Domagoj Belić,
• Mostafa M. Shawrav,
• Emmerich Bertagnolli and
• Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

• purity [48]. For cobalt, a combination of heat, H2 exposure and electron irradiation improved the metal content in the deposits [49]. Similarly, in the case of platinum, several purification approaches have been studied, including laser assisted purification [50][51], a sequential EBID process and

Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process

• Ragesh Kumar T P,
• Sangeetha Hari,
• Krishna K Damodaran,
• Oddur Ingólfsson and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2017, 8, 2376–2388, doi:10.3762/bjnano.8.237

• conducted the first EBID experiments with DCSCH and SCH, and we discuss these in the context of potential effects on the growth dynamics through the very different sensitivity of these molecules towards electrons of very low energy (<10 eV). Furthermore, both molecules are potential precursors for the

• EBID so far. Hence, the first experiment that was performed was just to observe whether something can be deposited from each of these precursor molecules. The precursor was introduced via a leak valve into the specimen chamber of a scanning electron microscope (SEM) (see Experimental section for

• that the significantly larger oxygen content in the deposits formed from DCSCH is the result of hydrolysis in reactions with residual water in the background gas and at the surfaces. In EBID pillar growth one can distinguish three stages: the nucleation stage, a fast-growth stage and a saturation stage

Comprehensive investigation of the electronic excitation of W(CO)₆ by photoabsorption and theoretical analysis in the energy region from 3.9 to 10.8 eV

• Mónica Mendes,
• Khrystyna Regeta,
• Filipe Ferreira da Silva,
• Nykola C. Jones,
• Søren Vrønning Hoffmann,
• Gustavo García,
• Chantal Daniel and
• Paulo Limão-Vieira

Beilstein J. Nanotechnol. 2017, 8, 2208–2218, doi:10.3762/bjnano.8.220

• *-orbitals, which play a significant role in the stability of carbonyl complexes, and in particular for W(CO)6 where the tungsten oxidation state is zero. W(CO)6 is a precursor molecule used in electron beam induced deposition (EBID) to produce well-defined tungsten-containing nanostructures [21][22

3D Nanoprinting via laser-assisted electron beam induced deposition: growth kinetics, enhanced purity, and electrical resistivity

• Brett B. Lewis,
• Robert Winkler,
• Xiahan Sang,
• Pushpa R. Pudasaini,
• Michael G. Stanford,
• Harald Plank,
• Raymond R. Unocic,
• Jason D. Fowlkes and
• Philip D. Rack

Beilstein J. Nanotechnol. 2017, 8, 801–812, doi:10.3762/bjnano.8.83

• of success. Recently, electron beam induced deposition (EBID) was extended to 3D nanoscale mesh geometries [11]. Deposition occurs during EBID as the nanoscale focused electron beam dissociates adsorbed precursor molecules. A condensed byproduct accumulates by prolonged electron exposure with the

• generates subsequent back-scattered (BSE), forward-scattered (FSE), and secondary electrons (SE). Conveniently, EBID has the advantage of being compatible with a wide range of precursor and substrate materials [12]. Several applications have been explored with EBID and focused electron beam induced etching

• of 3D growth have been demonstrated [35][36][37][38] beyond simple 1D nanowires, controlled growth of complex geometries using EBID has only recently been achieved based on a combined simulation and computer aided design approach [11]. This approach has also been used with Ga+ ion beam induced

Patterning technique for gold nanoparticles on substrates using a focused electron beam

• Takahiro Noriki,
• Shogo Abe,
• Kotaro Kajikawa and
• Masayuki Shimojo

Beilstein J. Nanotechnol. 2015, 6, 1010–1015, doi:10.3762/bjnano.6.104

• due to the deposition of amorphous carbon. This amorphous carbon most likely originates from organic molecules around the nanoparticles, as similar mechanisms of decomposition and deposition occur in electron beam-induced deposition (EBID) [9][10][11]. Fujita et al. reported that amorphous carbon was

Electron-stimulated purification of platinum nanostructures grown via focused electron beam induced deposition

• Brett B. Lewis,
• Michael G. Stanford,
• Jason D. Fowlkes,
• Kevin Lester,
• Harald Plank and
• Philip D. Rack

Beilstein J. Nanotechnol. 2015, 6, 907–918, doi:10.3762/bjnano.6.94

• concentration. Furthermore, the experimental results are modeled as a 2nd order reaction which is dependent on both the electron energy loss density and the oxygen concentration. In addition to purification, the post-deposition electron stimulated oxygen purification process enhances the resolution of the EBID

• immediate potential for high impact applications makes the purification strategies for FEBID an important area of study. Several strategies have been investigated for purifying EBID deposits (see Botman et al. [1] for a review). In situ purification strategies include: 1) precursors which easily decompose

• catalytic Pt–O reaction [18]. Finally, Mackus et al. have demonstrated that EBID deposited seed layers can be used as catalyst sites for selective area atomic layer deposition growth of Pt layers [19]. To this end, we have recently studied the post-deposition purification of platinum–carbon nanostructures

Electron-beam induced deposition and autocatalytic decomposition of Co(CO)₃NO

• Florian Vollnhals,
• Martin Drost,
• Fan Tu,
• Esther Carrasco,
• Andreas Späth,
• Rainer H. Fink,
• Hans-Peter Steinrück and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2014, 5, 1175–1185, doi:10.3762/bjnano.5.129

• Erlangen, Germany 10.3762/bjnano.5.129 Abstract The autocatalytic growth of arbitrarily shaped nanostructures fabricated by electron beam-induced deposition (EBID) and electron beam-induced surface activation (EBISA) is studied for two precursors: iron pentacarbonyl, Fe(CO)5, and cobalt tricarbonyl

• ) spectroscopy. It has previously been shown that Fe(CO)5 decomposes autocatalytically on Fe seed layers (EBID) and on certain electron beam-activated surfaces, yielding high purity, polycrystalline Fe nanostructures. In this contribution, we investigate the growth of structures from Co(CO)3NO and compare it to

• results obtained from Fe(CO)5. Co(CO)3NO exhibits autocatalytic growth on Co-containing seed layers prepared by EBID using the same precursor. The growth yields granular, oxygen-, carbon- and nitrogen-containing deposits. In contrast to Fe(CO)5 no decomposition on electron beam-activated surfaces is

Simulation of electron transport during electron-beam-induced deposition of nanostructures

• Francesc Salvat-Pujol,
• Harald O. Jeschke and
• Roser Valentí

Beilstein J. Nanotechnol. 2013, 4, 781–792, doi:10.3762/bjnano.4.89

• that addresses the multi-scale nature of the electron-beam-induced deposition (EBID) process. Furthermore, similar simulations can help to understand the role that is played by backscattered electrons and emitted secondary electrons in the change of structural properties of nanostructured materials

• during post-growth electron-beam treatments. Keywords: electron backscattering; electron transport; (F)EBID; Monte Carlo simulation; PENELOPE; Introduction Electron-beam-induced deposition (EBID) [1][2][3] is a suitable method for the template-free fabrication of nanostructures. Molecules of a

• nanostructure at the focus of the beam. In general, the obtained deposits exhibit a granular structure that consists of nanometer-sized metal crystallites, which are embedded in an insulating matrix. There are three main interactions that determine the growth of nanostructures in the EBID process: (1) the

Spontaneous dissociation of Co₂(CO)₈ and autocatalytic growth of Co on SiO₂: A combined experimental and theoretical investigation

• Kaliappan Muthukumar,
• Harald O. Jeschke,
• Roser Valentí,
• Evgeniya Begun,
• Johannes Schwenk,
• Fabrizio Porrati and
• Michael Huth

Beilstein J. Nanotechnol. 2012, 3, 546–555, doi:10.3762/bjnano.3.63

• dissociation of the precursor molecule. In view of these calculations, we discuss the origin of this dissociation and the subsequent autocatalysis. Keywords: Co2(CO)8; deposition; dissociation; EBID; FEBID; precursor; radiation-induced nanostructures; Introduction In recent years, focused electron beam