Cite the Following Article
Quantitative analysis of annealing-induced instabilities of photo-leakage current and negative-bias-illumination-stress in a-InGaZnO thin-film transistors
Dapeng Wang and Mamoru Furuta
Beilstein J. Nanotechnol. 2019, 10, 1125–1130.
https://doi.org/10.3762/bjnano.10.112
How to Cite
Wang, D.; Furuta, M. Beilstein J. Nanotechnol. 2019, 10, 1125–1130. doi:10.3762/bjnano.10.112
Download Citation
Citation data can be downloaded as file using the "Download" button or used for copy/paste from the text window
below.
Citation data in RIS format can be imported by all major citation management software, including EndNote,
ProCite, RefWorks, and Zotero.
Presentation Graphic
| Picture with graphical abstract, title and authors for social media postings and presentations. | ||
| Format: PNG | Size: 564.1 KB | Download |
Citations to This Article
Up to 20 of the most recent references are displayed here.
Scholarly Works
- Kim, N.; Ryu, C. H.; Lee, H. J.; Kim, T. G. High-Mobility Vertical Thin-Film Transistors Enabling Vertically Integrated OLED Devices for High-Density Displays. Elsevier BV 2025. doi:10.2139/ssrn.5462173
- Feria, D. N.; Huang, Q.-Z.; Yeh, C.-S.; Lin, S.-X.; Lin, D.-Y.; Tseng, B.-C.; Lian, J.-T.; Lin, T.-Y. Facile synthesis ofβ-Ga2O3based high-performance electronic devices via direct oxidation of solution-processed transition metal dichalcogenides. Nanotechnology 2024, 35, 125603. doi:10.1088/1361-6528/ad13bf
- Büschges, M. I.; Hoffmann, R. C.; Regoutz, A.; Schlueter, C.; Schneider, J. J. Atomic Layer Deposition of Ternary Indium/Tin/Aluminum Oxide Thin Films, Their Characterization and Transistor Performance under Illumination. Chemistry (Weinheim an der Bergstrasse, Germany) 2021, 27, 9791–9800. doi:10.1002/chem.202101126
- Agrawal, K.; Patil, V. S.; Chavan, G.; Yoon, G.; Kim, J.; Park, J.; Pae, S.; Kim, J.; Cho, E.-C.; Yi, J. Investigation of asymmetric degradation in electrical properties of a-InGaZnO thin-film transistor arrays as a function of channel width-to-length aspect ratio. Journal of Materials Science: Materials in Electronics 2020, 31, 9826–9834. doi:10.1007/s10854-020-03527-z