Fabrication of phase masks from amorphous carbon thin films for electron-beam shaping

Lukas Grünewald, Dagmar Gerthsen and Simon Hettler
Beilstein J. Nanotechnol. 2019, 10, 1290–1302. https://doi.org/10.3762/bjnano.10.128

Supporting Information

Supporting Information Files 1 to 3 contain videos of BB propagation corresponding to the intensity curves shown in Figure 6d. The intensity in Supporting Information File 2 and Supporting Information File 3 is normalized with respect to the maximum intensity in the corresponding image series. The contrast in Supporting Information File 1 is modified to enhance visibility. Image dimensions are 2.7 µm by 2.7 µm. The playback speed of Supporting Information File 1 and Supporting Information File 2 corresponds to 7 mm defocus per second. The playback speed of Supporting Information File 3 corresponds to 3.5 mm defocus per second. Supporting Information File 4 contains accompanying simulations for Figure 6 and Figure 8.

Supporting Information File 1: BB propagation for kρ = 5 µm−1.
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Supporting Information File 2: BB propagation for kρ = 7 µm−1.
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Supporting Information File 3: BB propagation for kρ = 10 µm−1.
Format: AVI Size: 10.9 MB Download
Supporting Information File 4: Accompanying simulations for Figure 6 and Figure 8.
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Cite the Following Article

Fabrication of phase masks from amorphous carbon thin films for electron-beam shaping
Lukas Grünewald, Dagmar Gerthsen and Simon Hettler
Beilstein J. Nanotechnol. 2019, 10, 1290–1302. https://doi.org/10.3762/bjnano.10.128

How to Cite

Grünewald, L.; Gerthsen, D.; Hettler, S. Beilstein J. Nanotechnol. 2019, 10, 1290–1302. doi:10.3762/bjnano.10.128

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