Stationary beam full-field transmission helium ion microscopy using sub-50 keV He+: Projected images and intensity patterns

Michael Mousley, Santhana Eswara, Olivier De Castro, Olivier Bouton, Nico Klingner, Christoph T. Koch, Gregor Hlawacek and Tom Wirtz
Beilstein J. Nanotechnol. 2019, 10, 1648–1657. https://doi.org/10.3762/bjnano.10.160

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Supporting Information File 1: The effect of varying the Lens 2 voltage on the BN deflection pattern.
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Supporting Information File 2: The effect of varying the Lens 2 voltage on the MgO deflection pattern.
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Supporting Information File 3: Description of supporting videos 1 and 2, SIMION results and methods (defocus and size on sample plane), a defocus series for a polycrystalline silicon sample, a magnification of images showing distortion of grid squares and a photograph of the THIM instrument.
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Stationary beam full-field transmission helium ion microscopy using sub-50 keV He+: Projected images and intensity patterns
Michael Mousley, Santhana Eswara, Olivier De Castro, Olivier Bouton, Nico Klingner, Christoph T. Koch, Gregor Hlawacek and Tom Wirtz
Beilstein J. Nanotechnol. 2019, 10, 1648–1657. https://doi.org/10.3762/bjnano.10.160

How to Cite

Mousley, M.; Eswara, S.; De Castro, O.; Bouton, O.; Klingner, N.; Koch, C. T.; Hlawacek, G.; Wirtz, T. Beilstein J. Nanotechnol. 2019, 10, 1648–1657. doi:10.3762/bjnano.10.160

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