Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering

Hamidreza Hajihoseini, Movaffaq Kateb, Snorri Þorgeir Ingvarsson and Jon Tomas Gudmundsson
Beilstein J. Nanotechnol. 2019, 10, 1914–1921. https://doi.org/10.3762/bjnano.10.186

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Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering
Hamidreza Hajihoseini, Movaffaq Kateb, Snorri Þorgeir Ingvarsson and Jon Tomas Gudmundsson
Beilstein J. Nanotechnol. 2019, 10, 1914–1921. https://doi.org/10.3762/bjnano.10.186

How to Cite

Hajihoseini, H.; Kateb, M.; Ingvarsson, S. Þ.; Gudmundsson, J. T. Beilstein J. Nanotechnol. 2019, 10, 1914–1921. doi:10.3762/bjnano.10.186

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