Integration of LaMnO3+δ films on platinized silicon substrates for resistive switching applications by PI-MOCVD

Raquel Rodriguez-Lamas, Dolors Pla, Odette Chaix-Pluchery, Benjamin Meunier, Fabrice Wilhelm, Andrei Rogalev, Laetitia Rapenne, Xavier Mescot, Quentin Rafhay, Hervé Roussel, Michel Boudard, Carmen Jiménez and Mónica Burriel
Beilstein J. Nanotechnol. 2019, 10, 389–398. https://doi.org/10.3762/bjnano.10.38

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Integration of LaMnO3+δ films on platinized silicon substrates for resistive switching applications by PI-MOCVD
Raquel Rodriguez-Lamas, Dolors Pla, Odette Chaix-Pluchery, Benjamin Meunier, Fabrice Wilhelm, Andrei Rogalev, Laetitia Rapenne, Xavier Mescot, Quentin Rafhay, Hervé Roussel, Michel Boudard, Carmen Jiménez and Mónica Burriel
Beilstein J. Nanotechnol. 2019, 10, 389–398. https://doi.org/10.3762/bjnano.10.38

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Rodriguez-Lamas, R.; Pla, D.; Chaix-Pluchery, O.; Meunier, B.; Wilhelm, F.; Rogalev, A.; Rapenne, L.; Mescot, X.; Rafhay, Q.; Roussel, H.; Boudard, M.; Jiménez, C.; Burriel, M. Beilstein J. Nanotechnol. 2019, 10, 389–398. doi:10.3762/bjnano.10.38

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