Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties

Hana Krýsová, Michael Neumann-Spallart, Hana Tarábková, Pavel Janda, Ladislav Kavan and Josef Krýsa

Beilstein J. Nanotechnol. 2021, 12, 24–34. https://doi.org/10.3762/bjnano.12.2

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