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Cite the Following Article
Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties
Hana Krýsová, Michael Neumann-Spallart, Hana Tarábková, Pavel Janda, Ladislav Kavan and Josef Krýsa
Beilstein J. Nanotechnol. 2021, 12, 24–34.
https://doi.org/10.3762/bjnano.12.2
How to Cite
Krýsová, H.; Neumann-Spallart, M.; Tarábková, H.; Janda, P.; Kavan, L.; Krýsa, J. Beilstein J. Nanotechnol. 2021, 12, 24–34. doi:10.3762/bjnano.12.2
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