Cite the Following Article
Selected properties of AlxZnyO thin films prepared by reactive pulsed magnetron sputtering using a two-element Zn/Al target
Witold Posadowski, Artur Wiatrowski, Jarosław Domaradzki and Michał Mazur
Beilstein J. Nanotechnol. 2022, 13, 344–354. https://doi.org/10.3762/bjnano.13.29
How to Cite
Posadowski, W.; Wiatrowski, A.; Domaradzki, J.; Mazur, M. Beilstein J. Nanotechnol. 2022, 13, 344–354. doi:10.3762/bjnano.13.29
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Citations to This Article
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- Wall, J. M.; Yan, F. Sputtering Process of ScxAl1−xN Thin Films for Ferroelectric Applications. Coatings 2022, 13, 54. doi:10.3390/coatings13010054