Selected properties of AlxZnyO thin films prepared by reactive pulsed magnetron sputtering using a two-element Zn/Al target

Witold Posadowski, Artur Wiatrowski, Jarosław Domaradzki and Michał Mazur
Beilstein J. Nanotechnol. 2022, 13, 344–354. https://doi.org/10.3762/bjnano.13.29

Cite the Following Article

Selected properties of AlxZnyO thin films prepared by reactive pulsed magnetron sputtering using a two-element Zn/Al target
Witold Posadowski, Artur Wiatrowski, Jarosław Domaradzki and Michał Mazur
Beilstein J. Nanotechnol. 2022, 13, 344–354. https://doi.org/10.3762/bjnano.13.29

How to Cite

Posadowski, W.; Wiatrowski, A.; Domaradzki, J.; Mazur, M. Beilstein J. Nanotechnol. 2022, 13, 344–354. doi:10.3762/bjnano.13.29

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