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Cite the Following Article
Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations
Grégoire R. N. Defoort-Levkov, Alan Bahm and Patrick Philipp
Beilstein J. Nanotechnol. 2022, 13, 986–1003.
https://doi.org/10.3762/bjnano.13.86
How to Cite
Defoort-Levkov, G. R. N.; Bahm, A.; Philipp, P. Beilstein J. Nanotechnol. 2022, 13, 986–1003. doi:10.3762/bjnano.13.86
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Scholarly Works
- Shcheblanov, N. S.; Léonard, C.; To, Q.-D.; Povarnitsyn, M. E.; Lemaître, A. Molecular Dynamics Study of the Formation of Porous Films by Room-Temperature Physical Vapor Deposition of Silica. The Journal of Physical Chemistry C 2024, 128, 17606–17618. doi:10.1021/acs.jpcc.4c02198
- Defoort-Levkov, G. R. N.; Bahm, A.; Philipp, P. Ultralow-energy amorphization of contaminated silicon samples investigated by molecular dynamics. Beilstein journal of nanotechnology 2023, 14, 834–849. doi:10.3762/bjnano.14.68
