Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations

Grégoire R. N. Defoort-Levkov, Alan Bahm and Patrick Philipp
Beilstein J. Nanotechnol. 2022, 13, 986–1003. https://doi.org/10.3762/bjnano.13.86

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Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations
Grégoire R. N. Defoort-Levkov, Alan Bahm and Patrick Philipp
Beilstein J. Nanotechnol. 2022, 13, 986–1003. https://doi.org/10.3762/bjnano.13.86

How to Cite

Defoort-Levkov, G. R. N.; Bahm, A.; Philipp, P. Beilstein J. Nanotechnol. 2022, 13, 986–1003. doi:10.3762/bjnano.13.86

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Scholarly Works

  • Defoort-Levkov, G. R. N.; Bahm, A.; Philipp, P. Ultralow-energy amorphization of contaminated silicon samples investigated by molecular dynamics. Beilstein journal of nanotechnology 2023, 14, 834–849. doi:10.3762/bjnano.14.68
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