TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes

Joshua Williams, Michael I. Faley, Joseph Vimal Vas, Peng-Han Lu and Rafal E. Dunin-Borkowski
Beilstein J. Nanotechnol. 2024, 15, 1–12. https://doi.org/10.3762/bjnano.15.1

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Supporting Information File 1: Video of Lorentz TEM measurements.
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Cite the Following Article

TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes
Joshua Williams, Michael I. Faley, Joseph Vimal Vas, Peng-Han Lu and Rafal E. Dunin-Borkowski
Beilstein J. Nanotechnol. 2024, 15, 1–12. https://doi.org/10.3762/bjnano.15.1

How to Cite

Williams, J.; Faley, M. I.; Vas, J. V.; Lu, P.-H.; Dunin-Borkowski, R. E. Beilstein J. Nanotechnol. 2024, 15, 1–12. doi:10.3762/bjnano.15.1

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