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Cite the Following Article
Investigating ripple pattern formation and damage profiles in Si and Ge induced by 100 keV Ar+ ion beam: a comparative study
Indra Sulania, Harpreet Sondhi, Tanuj Kumar, Sunil Ojha, G R Umapathy, Ambuj Mishra, Ambuj Tripathi, Richa Krishna, Devesh Kumar Avasthi and Yogendra Kumar Mishra
Beilstein J. Nanotechnol. 2024, 15, 367–375.
https://doi.org/10.3762/bjnano.15.33
How to Cite
Sulania, I.; Sondhi, H.; Kumar, T.; Ojha, S.; Umapathy, G. R.; Mishra, A.; Tripathi, A.; Krishna, R.; Avasthi, D. K.; Mishra, Y. K. Beilstein J. Nanotechnol. 2024, 15, 367–375. doi:10.3762/bjnano.15.33
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