Cite the Following Article
Performance optimization of a microwave-coupled plasma-based ultralow-energy ECR ion source for silicon nanostructuring
Joy Mukherjee, Safiul Alam Mollick, Tanmoy Basu and Tapobrata Som
Beilstein J. Nanotechnol. 2025, 16, 484–494.
https://doi.org/10.3762/bjnano.16.37
How to Cite
Mukherjee, J.; Mollick, S. A.; Basu, T.; Som, T. Beilstein J. Nanotechnol. 2025, 16, 484–494. doi:10.3762/bjnano.16.37
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