Characterization of ion track-etched conical nanopores in thermal and PECVD SiO2 using small angle X-ray scattering

Shankar Dutt, Rudradeep Chakraborty, Christian Notthoff, Pablo Mota-Santiago, Christina Trautmann and Patrick Kluth
Beilstein J. Nanotechnol. 2025, 16, 899–909. https://doi.org/10.3762/bjnano.16.68

Cite the Following Article

Characterization of ion track-etched conical nanopores in thermal and PECVD SiO2 using small angle X-ray scattering
Shankar Dutt, Rudradeep Chakraborty, Christian Notthoff, Pablo Mota-Santiago, Christina Trautmann and Patrick Kluth
Beilstein J. Nanotechnol. 2025, 16, 899–909. https://doi.org/10.3762/bjnano.16.68

How to Cite

Dutt, S.; Chakraborty, R.; Notthoff, C.; Mota-Santiago, P.; Trautmann, C.; Kluth, P. Beilstein J. Nanotechnol. 2025, 16, 899–909. doi:10.3762/bjnano.16.68

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