Time of flight secondary ion mass spectrometry imaging of contaminant species in chemical vapour deposited graphene on copper

Barry Brennan, Vlad-Petru Veigang-Radulescu, Philipp Braeuninger-Weimer, Stephan Hofmann and Andrew J. Pollard
Beilstein J. Nanotechnol. 2026, 17, 200–213. https://doi.org/10.3762/bjnano.17.13

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Cite the Following Article

Time of flight secondary ion mass spectrometry imaging of contaminant species in chemical vapour deposited graphene on copper
Barry Brennan, Vlad-Petru Veigang-Radulescu, Philipp Braeuninger-Weimer, Stephan Hofmann and Andrew J. Pollard
Beilstein J. Nanotechnol. 2026, 17, 200–213. https://doi.org/10.3762/bjnano.17.13

How to Cite

Brennan, B.; Veigang-Radulescu, V.-P.; Braeuninger-Weimer, P.; Hofmann, S.; Pollard, A. J. Beilstein J. Nanotechnol. 2026, 17, 200–213. doi:10.3762/bjnano.17.13

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