Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

Cheng Huang, Markus Moosmann, Jiehong Jin, Tobias Heiler, Stefan Walheim and Thomas Schimmel

Beilstein J. Nanotechnol. 2012, 3, 620–628. https://doi.org/10.3762/bjnano.3.71

Supporting Information

Supporting Information File 1: Snow-jet treatment of FDTS-SAM.
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