Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

Cheng Huang, Markus Moosmann, Jiehong Jin, Tobias Heiler, Stefan Walheim and Thomas Schimmel
Beilstein J. Nanotechnol. 2012, 3, 620–628. https://doi.org/10.3762/bjnano.3.71

Supporting Information

Supporting Information File 1: Snow-jet treatment of FDTS-SAM.
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Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers
Cheng Huang, Markus Moosmann, Jiehong Jin, Tobias Heiler, Stefan Walheim and Thomas Schimmel
Beilstein J. Nanotechnol. 2012, 3, 620–628. https://doi.org/10.3762/bjnano.3.71

How to Cite

Huang, C.; Moosmann, M.; Jin, J.; Heiler, T.; Walheim, S.; Schimmel, T. Beilstein J. Nanotechnol. 2012, 3, 620–628. doi:10.3762/bjnano.3.71

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