Cyclic photochemical re-growth of gold nanoparticles: Overcoming the mask-erosion limit during reactive ion etching on the nanoscale

Burcin Özdemir, Axel Seidenstücker, Alfred Plettl and Paul Ziemann
Beilstein J. Nanotechnol. 2013, 4, 886–894. https://doi.org/10.3762/bjnano.4.100

Supporting Information

Supporting Information features complementary images and calculations of the stabilizing effect of an OTMS layer on the position of Au NP decorated substrates and cyclic fabricated high aspect ratio nanopillar arrays.

Supporting Information File 1: Complementary images and calculations.
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Cite the Following Article

Cyclic photochemical re-growth of gold nanoparticles: Overcoming the mask-erosion limit during reactive ion etching on the nanoscale
Burcin Özdemir, Axel Seidenstücker, Alfred Plettl and Paul Ziemann
Beilstein J. Nanotechnol. 2013, 4, 886–894. https://doi.org/10.3762/bjnano.4.100

How to Cite

Özdemir, B.; Seidenstücker, A.; Plettl, A.; Ziemann, P. Beilstein J. Nanotechnol. 2013, 4, 886–894. doi:10.3762/bjnano.4.100

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