Cite the Following Article
Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer
Ulrich C. Fischer, Carsten Hentschel, Florian Fontein, Linda Stegemann, Christiane Hoeppener, Harald Fuchs and Stefanie Hoeppener
Beilstein J. Nanotechnol. 2014, 5, 1441–1449.
https://doi.org/10.3762/bjnano.5.156
How to Cite
Fischer, U. C.; Hentschel, C.; Fontein, F.; Stegemann, L.; Hoeppener, C.; Fuchs, H.; Hoeppener, S. Beilstein J. Nanotechnol. 2014, 5, 1441–1449. doi:10.3762/bjnano.5.156
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