Identifying the nature of surface chemical modification for directed self-assembly of block copolymers
Beilstein J. Nanotechnol. 2017, 8, 1972–1981. https://doi.org/10.3762/bjnano.8.198
Supporting Information
Simulated proportion of the O–C=O contribution to the normalized C 1s spectrum as a function of the photoelectron kinetic energy. AFM images of a mold oxidation stamp fabricated on glass by NIL and metalized (5 nm Cr/70 nm Au) and corresponding parallel oxidation pattern on PS–OH. Photoemission spectra of the Si 2p line taken with 2020 eV photons of a PS/SiO2/Si sample. Photoemission spectra of the C 1s lines of the PON sample taken with 2020 and 3000 eV photons.
| Supporting Information File 1: Additional experimental results. | ||
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References
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Presentation Graphic
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