Cite the Following Article
Surface improvement of organic photoresists using a near-field-dependent etching method
Felix J. Brandenburg, Tomohiro Okamoto, Hiroshi Saito, Benjamin Leuschel, Olivier Soppera and Takashi Yatsui
Beilstein J. Nanotechnol. 2017, 8, 784–788.
https://doi.org/10.3762/bjnano.8.81
How to Cite
Brandenburg, F. J.; Okamoto, T.; Saito, H.; Leuschel, B.; Soppera, O.; Yatsui, T. Beilstein J. Nanotechnol. 2017, 8, 784–788. doi:10.3762/bjnano.8.81
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