Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition

Lukas Keller and Michael Huth
Beilstein J. Nanotechnol. 2018, 9, 2581–2598. https://doi.org/10.3762/bjnano.9.240

Supporting Information

Explains the input and output files of the pattern generator program in detail (see also Figure 1). The parameters of the settings file setf are defined. The structure of the geometry file geof and the generated pattern file are shown. The usage of the illustration file and the description file is demonstrated.

Supporting Information File 1: Supporting information.
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Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition
Lukas Keller and Michael Huth
Beilstein J. Nanotechnol. 2018, 9, 2581–2598. https://doi.org/10.3762/bjnano.9.240

How to Cite

Keller, L.; Huth, M. Beilstein J. Nanotechnol. 2018, 9, 2581–2598. doi:10.3762/bjnano.9.240

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