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Beilstein J. Nanotechnol. 2018, 9, 2700–2707, doi:10.3762/bjnano.9.252
Samples after adhesion test. (a–c) Mo/SLG; (d–f) Mo/Cr/SLG. (a, d) 100 W, 10 mTorr, (b, e) 150 W, 5...
Sheet resistivity of Mo/Cr films prepared at different values of sputtering power and pressure.
Surface SEM images of Mo/Cr films prepared at sputtering power and pressure values of (a) 100 W, 3 ...
Average surface roughness of Mo/Cr films prepared at different sputtering powers and pressures.
X-ray diffraction peaks of Mo/Cr films prepared using different values of sputtering power and pres...
Optical reflectance of Mo/Cr films prepared using different values of sputtering power and pressure....
XPS depth profile of the Mo/Cr films deposited at 200 W and 3 mTorr.
J–V characteristics of the CZTS cell with Mo/Cr bilayer back contact.