1 article(s) from Gleixner, Julia
Optical set-up. The sample is mounted on an x–y micrometer stage and can be moved reversibly below ...
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(a) Laser profile at the sample position taken with a CCD camera. Next to the central maximum the f...
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Scanning electron micrographs of different types of triangles used in the course of this work. The ...
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AFM image of a colloid lithography triangle. (a) Top view; (b) 3D image.
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Upper left: Fluence distribution along the laser spot radius as described in the Experimental secti...
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(a) Calculated field intensity enhancement, (b) dissipation, and (c) field distribution for a nanot...
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(a) AFM image of a Si surface with ablation holes, generated by irradiation of colloid lithography ...
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Hole depth (as determined from profiles such as in Figure 7b, measured with respect to the height of the fla...
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AFM image and height profile of an ablation hole generated by far-field ablation of bare Si (same w...
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Depth of holes in Si, generated by far-field ablation, as a function of the peak fluence.
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SEM micrographs of two different types of nanotriangles prepared by electron beam lithography, and ...
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FDTD calculations for the structures presented in Figure 11. The field intensity enhancement was extracted i...
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(a) SEM micrograph and (b) calculated field distribution for the center region of a bow-tie antenna...
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Evolution of laser-molten gold triangles (thickness: 40 nm, side length: 530 nm, prepared by colloi...
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(a) SEM micrograph of colloid lithography nanotriangles irradiated with a 300 ps laser pulse (wavel...
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Molten volume at the triangle tips vs local laser fluence.
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SEM micrographs of a 40 nm Au film on Si, after exposition to a 300 ps laser pulse at 800 nm wavele...
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Beilstein J. Nanotechnol. 2013, 4, 588–602, doi:10.3762/bjnano.4.66
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