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Beilstein J. Nanotechnol. 2025, 16, 1097–1112, doi:10.3762/bjnano.16.81
Figure 1: Comparison of XRD patterns of TiO2 thin films deposited by (a) EBE and (b, c) IBAD before and after...
Figure 2: Raman spectra of TiO2 thin films deposited by (a) EBE and (b, c) IBAD before and after additional p...
Figure 3: Scanning electron microscopy images of TiO2 thin films before and after post-process annealing at 8...
Figure 4: Transmittance spectra of TiO2 thin films before and after post-process annealing at 800 °C deposite...
Figure 5: (a–c) Optical bandgap energy and (d–f) Urbach energy as function of the photon energy.
Figure 6: Comparison of (a) refractive index and (b) extinction coefficient of as-deposited TiO2 films.
Figure 7: Hardness of as-deposited and annealed TiO2 thin films deposited by electron beam evaporation method...
Figure 8: Results of surface topography measurements before and after abrasion tests of TiO2 thin films depos...
Figure 9: Results of surface topography measurements before and after abrasion tests of TiO2 thin films depos...
Figure 10: The dependence of (a) hardness and (b, c) surface roughness before and after abrasion tests on ion ...