1 article(s) from Rowell, N. L.
Schematic representation of the process steps: (a) formation of SiO2 (5 nm thick) by RTO; (b) openi...
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Scanning electron microscope (SEM) images of the ordered arrays of Si NWs showing (left) a NW array...
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The raw PL spectrum obtained from sample (C) at 6 K with excitation at 405 and 458 nm.
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Temperature dependence of the instrument-response-corrected PL spectrum obtained from sample (C) wi...
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Instrument-response-corrected PL spectra obtained with 405 nm excitation from the (A), (B), and (C)...
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Curve-resolved PL spectrum of (a) sample (A), (b) sample (B), and (c) sample (C) at 25 K obtained w...
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Beilstein J. Nanotechnol. 2014, 5, 2498–2504, doi:10.3762/bjnano.5.259
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