2 article(s) from Saito, Hiroshi
Schematic of the near-field etching process.
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Experimental setup for the near-field wet etching technique.
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Time dependence of surface roughness using a solution (wet etchng). AFM images taken (a) before etc...
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Time dependence of Fourier power spectra using a solution. Fourier power spectra taken (a) before e...
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Time dependence of surface roughness. AFM images taken (a) before etching and (b) after 30 min. (c)...
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Time dependence of Fourier power spectra using a gas. Fourier power spectra taken (a) before etchin...
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Beilstein J. Nanotechnol. 2017, 8, 2181–2185, doi:10.3762/bjnano.8.217
AFM images of the photoresist after 120 min of near-field etching with a He–Cd laser (325 nm, 3.81 ...
(a) Photoresist profile before (black) and after 60 min (blue) and 120 min (red) of 325 nm laser il...
(a) Evaluation of surface roughness reduction of 325 nm (purple) and 405 nm (blue) over a 2 h inter...
Absorption spectrum and cross-sectional profile. (a) Photoresist absorption curve, showing that 325...
Beilstein J. Nanotechnol. 2017, 8, 784–788, doi:10.3762/bjnano.8.81
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