2 article(s) from Soppera, Olivier
AFM images of the photoresist after 120 min of near-field etching with a He–Cd laser (325 nm, 3.81 ...
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(a) Photoresist profile before (black) and after 60 min (blue) and 120 min (red) of 325 nm laser il...
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(a) Evaluation of surface roughness reduction of 325 nm (purple) and 405 nm (blue) over a 2 h inter...
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Absorption spectrum and cross-sectional profile. (a) Photoresist absorption curve, showing that 325...
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Beilstein J. Nanotechnol. 2017, 8, 784–788, doi:10.3762/bjnano.8.81
(a) Schematic diagram of a dressed photon–phonon (DPP). (b–d) Schematic diagrams of DPP etching. Th...
Typical atomic force microscopy (AFM) images of a type-Ib diamond (111) substrate with a 5 μm × 5 μ...
AFM images of the GaN surface (a) before and (b) after DPP etching. (c) Enlarged view (1.0 μm × 1.0...
(a, b) Schematic diagrams of the DPP etching of substrates with nanostripe patterns. AFM images of ...
AFM images of the alumina substrate surface after RF sputtering (a) without and (b) with visible li...
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Beilstein J. Nanotechnol. 2013, 4, 875–885, doi:10.3762/bjnano.4.99
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