1 article(s) from Strassner, Johannes

Precise in situ etch depth control of multilayered III−V semiconductor samples with reflectance anisotropy spectroscopy (RAS) equipment

  1. Ann-Kathrin Kleinschmidt,
  2. Lars Barzen,
  3. Johannes Strassner,
  4. Christoph Doering,
  5. Henning Fouckhardt,
  6. Wolfgang Bock,
  7. Michael Wahl and
  8. Michael Kopnarski
  • Full Research Paper
  • Published 21 Nov 2016

  • PDF

Beilstein J. Nanotechnol. 2016, 7, 1783–1793, doi:10.3762/bjnano.7.171

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