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1 article(s) from Wiatrowski, Artur

Selected properties of Al_xZn_yO thin films prepared by reactive pulsed magnetron sputtering using a two-element Zn/Al target

Witold Posadowski,
Artur Wiatrowski,
Jarosław Domaradzki and
Michał Mazur

Beilstein J. Nanotechnol. 2022, 13, 344–354, doi:10.3762/bjnano.13.29

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Figure 1: Schematic diagram of a sputtering system for the deposition of Al_xZn_yO films.

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Figure 2: View of the working magnetron and glass strip substrate positioned over the Zn/Al target.

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Figure 3: Magnetron source with Zn/Al target and images showing tested arrangements of Al inserts.

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Figure 4: Surface resistance measured for the thin film deposited on both sides of the glass substrate as a f...

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Figure 5: Results of investigations on optical transmission: (a) transmission (T) spectra and (b) dependence ...

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Figure 6: Dependence of thickness of thin films deposited on the front and back sides of the substrate as a f...

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Figure 7: Distribution of the resistivity of thin films deposited on the front and back sides of the glass su...

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Figure 8: Results of the optical bandgap width estimated from optical measurements for thin films deposited a...

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Figure 9: Results of the structural investigation: (a) XRD patterns and (b) crystallite sizes as functions of...

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Figure 10: SEM images of the surface of thin films deposited on the front substrate surface at different dista...

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Figure 11: Al/Zn ratio in thin films deposited on the front side of the glass substrate as a function of the d...

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Full Research Paper

Published 31 Mar 2022

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Selected properties of AlxZnyO thin films prepared by reactive pulsed magnetron sputtering using a two-element Zn/Al target

Selected properties of Al_xZn_yO thin films prepared by reactive pulsed magnetron sputtering using a two-element Zn/Al target