Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al₂O₃-films

• Jörg Haeberle,
• Karsten Henkel,
• Hassan Gargouri,
• Franziska Naumann,
• Bernd Gruska,
• Michael Arens,
• Massimo Tallarida and
• Dieter Schmeißer

Beilstein J. Nanotechnol. 2013, 4, 732–742, doi:10.3762/bjnano.4.83

• [8] or corrosion protection [9]. Recently, there is a growing activity in covering photo-electrodes or electrodes by ultra-thin Al2O3 ALD layers for electrochemical energy generation and storage systems [10] in order to enhance the efficiency and durability of such devices. This includes for example