Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching

• Manuel R. Gonçalves,
• Taron Makaryan,
• Fabian Enderle,
• Stefan Wiedemann,
• Alfred Plettl,
• Othmar Marti and
• Paul Ziemann

Beilstein J. Nanotechnol. 2011, 2, 448–458, doi:10.3762/bjnano.2.49

• of nanometers. However, instead of casting the resist for preparation of the mask for RIE, high ordered arrays of PS spheres can be used directly. With this in mind, we propose two fabrication routes to obtain periodic structures comprising arrays of nanocavities in metal films. Both techniques are