Direct-write polymer nanolithography in ultra-high vacuum

• Woo-Kyung Lee,
• Minchul Yang,
• Arnaldo R. Laracuente,
• William P. King,
• Lloyd J. Whitman and
• Paul E. Sheehan

Beilstein J. Nanotechnol. 2012, 3, 52–56, doi:10.3762/bjnano.3.6

• vacuum (UHV), to be used effectively. While the suite of established vacuum deposition technologies is vast and capable of highly precise deposition, there are relatively few methods to perform additive lithography in a single deposition step. Additive lithography deposits only the material that is

Sensing surface PEGylation with microcantilevers

• Natalija Backmann,
• Natascha Kappeler,
• Thomas Braun,
• François Huber,
• Hans-Peter Lang,
• Christoph Gerber and
• Roderick Y. H. Lim

Beilstein J. Nanotechnol. 2010, 1, 3–13, doi:10.3762/bjnano.1.2

• , rinsed three times with water followed by ethanol and dried in air. The upper sides of microcantilevers were coated with a 2 nm-layer of Ti followed by a 25 nm thick Au layer without breaking the vacuum. Deposition of metal layers was performed in an EVA 300 electron beam evaporator (Alliance Concept