Directed deposition of silicon nanowires using neopentasilane as precursor and gold as catalyst

• Britta Kämpken,
• Verena Wulf,
• Norbert Auner,
• Marcel Winhold,
• Michael Huth,
• Daniel Rhinow and
• Andreas Terfort

Beilstein J. Nanotechnol. 2012, 3, 535–545, doi:10.3762/bjnano.3.62

• deposited as a thin film and thermally annealed, but can also be patterned by using UV irradiation, providing access to laterally structured layers of silicon nanowires. Keywords: chemical vapor deposition; gold; nanoparticle; patterning; radiation-induced nanostructures; vapor-liquid-solid mechanism

• nanosized wires (NW) of silicon including thermal evaporation [9], molecular beam epitaxy [10], laser ablation [11], chemical vapor deposition (CVD) [12] and CVD in combination with the vapor–liquid–solid (VLS) method [13]. In the VLS mechanism, small solid metal particles catalyze the decomposition of the

Approaches to nanostructure control and functionalizations of polymer@silica hybrid nanograss generated by biomimetic silica mineralization on a self-assembled polyamine layer

• Jian-Jun Yuan and
• Ren-Hua Jin

Beilstein J. Nanotechnol. 2011, 2, 760–773, doi:10.3762/bjnano.2.84

• transformation [7]. Silica nanowire films can be fabricated by catalyst-promoted vapor–liquid–solid (VLS) or solid–liquid–solid (SLS) processes under high temperature conditions, where metallic nanoparticles such as gold, gallium, and tin as catalysts are generally used to improve nanowire nucleation and growth