Beilstein J. Nanotechnol.2011,2, 318–326, doi:10.3762/bjnano.2.37
with thicknesses of 10 nm, 20 nm, 40 nm and 60 nm on the pre-patterned substrates using electronbeamevaporation at a base pressure of 2 × 10−7 mbar. Film thicknesses were determined by the quartz crystal monitor and then verified by profilometer measurements (Dektak 150 – Veeco). After deposition
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Figure 1:
SEM images at 45° tilt of (a) a square array of pyramidal pits (substrate A) and (b) an array of ci...