Effect of Ag loading position on the photocatalytic performance of TiO₂ nanocolumn arrays

• Jinghan Xu,
• Yanqi Liu and
• Yan Zhao

Beilstein J. Nanotechnol. 2020, 11, 717–728, doi:10.3762/bjnano.11.59

• photolithography and the template method by Sung et al. [30]. In this case, Ag particles were loaded on the outside of the nanocolumns by magnetron sputtering, and the catalysis was carried out at a sputtering time of 30 min. Besides, Jani et al. [31] studied the preparation of TiO2 nanotube arrays by anodization

Structural optical and electrical properties of a transparent conductive ITO/Al–Ag/ITO multilayer contact

• Aliyu Kabiru Isiyaku,
• Ahmad Hadi Ali and
• Nafarizal Nayan

Beilstein J. Nanotechnol. 2020, 11, 695–702, doi:10.3762/bjnano.11.57

• enhanced optical transmittance. Conclusion ITO/Al-Ag/ITO (IAAI) multilayer films were deposited by RF and DC magnetron sputtering at room temperature. The inclusion of the Al–Ag bilayer coupled with annealing at 400 °C significantly enhanced the microstructural, optical and electrical properties of the

• measurements) were used as substrates. Decon90 glass cleaner was used for glass substrate cleansing. Thin film preparation A SNTEK Korea magnetron sputtering system with a dual radio frequency (RF)/direct current (DC) sputtering source with a main deposition chamber 15.7 inches in height and 23.6 inches in

Evolution of Ag nanostructures created from thin films: UV–vis absorption and its theoretical predictions

• Robert Kozioł,
• Marcin Łapiński,
• Paweł Syty,
• Damian Koszelow,
• Wojciech Sadowski,
• Józef E. Sienkiewicz and
• Barbara Kościelska

Beilstein J. Nanotechnol. 2020, 11, 494–507, doi:10.3762/bjnano.11.40

• thickness) were deposited using a table-top dc magnetron sputtering coater (EM SCD 500, Leica) in pure Ar plasma (argon, Air Products 99.999%). The Ag target was of 99.99% purity, the rate of layer deposition was about 0.4 nm·s−1, and the incident power was in the range of 30–40 W. The layer thickness was

Advanced hybrid nanomaterials

• Andreas Taubert,
• Fabrice Leroux,
• Pierre Rabu and
• Verónica de Zea Bermudez

Beilstein J. Nanotechnol. 2019, 10, 2563–2567, doi:10.3762/bjnano.10.247

• electronic devices” [29]. A combination of deposition techniques was used, chemical vapor deposition for parylene and RF-magnetron sputtering for silver nanoparticles. The content and size of the latter influences the dielectric characteristics of the resulting hybrid films. Such devices may find application

Formation of metal/semiconductor Cu–Si composite nanostructures

• Natalya V. Yumozhapova,
• Andrey V. Nomoev,
• Vyacheslav V. Syzrantsev and
• Erzhena C. Khartaeva

Beilstein J. Nanotechnol. 2019, 10, 2497–2504, doi:10.3762/bjnano.10.240

• they are immiscible in the bulk state. In addition to chemical techniques [9][10][11][12], physical methods such as gas-phase methods [5][6][15], laser ablation [7][8][16], and magnetron-sputter gas-phase condensation [17] have been developed. When these methods are combined with the possibility of

Facile synthesis of carbon nanotube-supported NiO//Fe₂O₃ for all-solid-state supercapacitors

• Shengming Zhang,
• Xuhui Wang,
• Yan Li,
• Xuemei Mu,
• Yaxiong Zhang,
• Jingwei Du,
• Guo Liu,
• Xiaohui Hua,
• Yingzhuo Sheng,
• Erqing Xie and
• Zhenxing Zhang

Beilstein J. Nanotechnol. 2019, 10, 1923–1932, doi:10.3762/bjnano.10.188

• . deposited iron oxide on CNTs by atomic layer deposition (ALD) and the obtained CNTs@Fe2O3 presented a specific capacitance of 580.6 F·g−1 at 5 A·g−1 [21]. Zhang et al. used magnetron sputtering to prepare sandwich-like CNT@Fe2O3@C structures, and the composite exhibited a specific capacitance of 787.5 F·g−1

Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering

• Hamidreza Hajihoseini,
• Movaffaq Kateb,
• Snorri Þorgeir Ingvarsson and
• Jon Tomas Gudmundsson

Beilstein J. Nanotechnol. 2019, 10, 1914–1921, doi:10.3762/bjnano.10.186

• -100 44, Stockholm, Sweden 10.3762/bjnano.10.186 Abstract Background: Oblique angle deposition is known for yielding the growth of columnar grains that are tilted in the direction of the deposition flux. Using this technique combined with high-power impulse magnetron sputtering (HiPIMS) can induce

• unique properties in ferromagnetic thin films. Earlier we have explored the properties of polycrystalline and epitaxially deposited permalloy thin films deposited under 35° tilt using HiPIMS and compared it with films deposited by dc magnetron sputtering (dcMS). The films prepared by HiPIMS present lower

• properties for some important technological applications in addition to the ability to fill high aspect ratio trenches and coating on cutting tools with complex geometries. Keywords: glancing angle deposition (GLAD); high-power impulse magnetron sputtering (HiPIMS); oblique angle deposition; magnetron

Fabrication and characterization of Si_1−xGe_x nanocrystals in as-grown and annealed structures: a comparative study

• Muhammad Taha Sultan,
• Adrian Valentin Maraloiu,
• Ionel Stavarache,
• Jón Tómas Gudmundsson,
• Andrei Manolescu,
• Valentin Serban Teodorescu,
• Magdalena Lidia Ciurea and
• Halldór Gudfinnur Svavarsson

Beilstein J. Nanotechnol. 2019, 10, 1873–1882, doi:10.3762/bjnano.10.182

• , 050094 Bucharest, Romania 10.3762/bjnano.10.182 Abstract Multilayer structures comprising of SiO2/SiGe/SiO2 and containing SiGe nanoparticles were obtained by depositing SiO2 layers using reactive direct current magnetron sputtering (dcMS), whereas, Si and Ge were co-sputtered using dcMS and high-power

• impulse magnetron sputtering (HiPIMS). The as-grown structures subsequently underwent rapid thermal annealing (550–900 °C for 1 min) in N2 ambient atmosphere. The structures were investigated using X-ray diffraction, high-resolution transmission electron microscopy together with spectral photocurrent

• consequential interface characteristics and its effect on the photocurrent spectra. Keywords: grazing incidence XRD (GIXRD); high-power impulse magnetron sputtering (HiPIMS); HRTEM; magnetron sputtering; photocurrent spectra; SiGe nanocrystals in SiO2/SiGe/SiO2 multilayers; STEM-HAADF; TEM; Introduction

Subsurface imaging of flexible circuits via contact resonance atomic force microscopy

• Wenting Wang,
• Chengfu Ma,
• Yuhang Chen,
• Lei Zheng,
• Huarong Liu and
• Jiaru Chu

Beilstein J. Nanotechnol. 2019, 10, 1636–1647, doi:10.3762/bjnano.10.159

• 11 wt % PMMA in anisole solvent at 1500 rpm for 5 min, resulting in a thickness of approximately 3.5 µm. Then, a 300 nm thick Au film was sputtered on the PMMA substrate by using magnetron sputtering. The Au film was subsequently patterned by focused ion beam (FIB) milling (FEI, Helios NanoLab 650

Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering

• Petronela Prepelita,
• Ionel Stavarache,
• Doina Craciun,
• Florin Garoi,
• Catalin Negrila,
• Beatrice Gabriela Sbarcea and
• Valentin Craciun

Beilstein J. Nanotechnol. 2019, 10, 1511–1522, doi:10.3762/bjnano.10.149

• temperature by radio-frequency magnetron sputtering (rfMS). After deposition, the films were subjected to a RTA process at 575 °C (heating rate 20 °C/s), maintained at this temperature for 10 minutes, then cooled down to room temperature at a rate of 20 °C/s. The film structure was modified by changing the

• treatment in an open atmosphere. Such films could be used to manufacture transparent contact electrodes for solar cells. Keywords: conductive transparent electrodes; indium tin oxide (ITO) films; optical properties; radio-frequency magnetron sputtering (rfMS); rapid thermal annealing (RTA); Introduction

• of ITO in various applications increases when the electrical properties are improved. Various deposition techniques have been used to obtain TCO thin films, such as: vacuum thermal evaporation [15][16], chemical vapor deposition [17], sol–gel [18], pyrolysis spray techniques [5][19], magnetron

Gas sensing properties of individual SnO₂ nanowires and SnO₂ sol–gel nanocomposites

• Alexey V. Shaposhnik,
• Dmitry A. Shaposhnik,
• Sergey Yu. Turishchev,
• Olga A. Chuvenkova,
• Stanislav V. Ryabtsev,
• Alexey A. Vasiliev,
• Xavier Vilanova,
• Francisco Hernandez-Ramirez and
• Joan R. Morante

Beilstein J. Nanotechnol. 2019, 10, 1380–1390, doi:10.3762/bjnano.10.136

• and high surface-to-volume ratio, obtained by sintering, are traditionally used as sensing materials. By means of preparation methods such as magnetron sputtering, laser ablation, and pulverization, layer-by-layer nanoparticle deposition can be achieved with adhesion to the substrate and to previously

• ; this difference can be related to the contributions from the sorbed components. The O 1s component at 532 eV binding energy, prevailing on wire-like sample surfaces, was previously observed on metallic tin foil surfaces stored under laboratory conditions [38] and for magnetron sputtered tin nanolayers

• intensity of the 533.6 eV component (Figure 6) of the O 1s line [51]. Previously, this component was observed on polycrystalline nanolayers formed by magnetron sputtering of tin and ambient air oxidation afterwards [47]. Figure 7 compares XANES Sn M4,5 spectra of the samples with those obtained on the SnO2

Periodic Co/Nb pseudo spin valve for cryogenic memory

• Nikolay Klenov,
• Yury Khaydukov,
• Sergey Bakurskiy,
• Roman Morari,
• Igor Soloviev,
• Vladimir Boian,
• Thomas Keller,
• Mikhail Kupriyanov,
• Anatoli Sidorenko and
• Bernhard Keimer

Beilstein J. Nanotechnol. 2019, 10, 833–839, doi:10.3762/bjnano.10.83

• ≈ 6–10 nm, the value found in our prior studies [31][32]. The thickness of the Co layers were in the range of ξF ≈ 1 nm [19], which is enough to form a homogeneous and magnetic layer [26]. The sample was prepared using a Leybold Z-400 magnetron machine at room temperature on an R-plane-oriented

Biomimetic synthesis of Ag-coated glasswing butterfly arrays as ultra-sensitive SERS substrates for efficient trace detection of pesticides

• Guochao Shi,
• Mingli Wang,
• Yanying Zhu,
• Yuhong Wang,
• Xiaoya Yan,
• Xin Sun,
• Haijun Xu and
• Wanli Ma

Beilstein J. Nanotechnol. 2019, 10, 578–588, doi:10.3762/bjnano.10.59

• hybrids (Ag-G.b.) by magnetron sputtering technology. The 3D surface-enhanced Raman scattering (SERS) substrate is fabricated from an original chitin-based nanostructure, which serves as a bio-scaffold for Ag nanofilms to be coated on. The novel crisscrossing plate-like nanostructures of 3D Ag-G.b

• a bio-scaffold for the coating with magnetron-sputtered Ag nanofilms. The thickness of Ag nanofilms and the size of the nanogaps deposited on the G.b. wing arrays can be easily controlled by tuning the sputtering time. In order to find the optimum SERS enhancement performance, the sputtering time is

• successfully fabricated by magnetron sputtering. The thickness of the Ag nanofilms can be well controlled by adjusting the sputtering time. The Ag-G.b.-20 substrate with large-scale “hot spots” and an increased roughness shows the highest enhancement efficiency for CV molecules. The EF for Ag-G.b.-20 arrays is

Nanocomposite–parylene C thin films with high dielectric constant and low losses for future organic electronic devices

• Marwa Mokni,
• Gianluigi Maggioni,
• Abdelkader Kahouli,
• Sara M. Carturan,
• Walter Raniero and
• Alain Sylvestre

Beilstein J. Nanotechnol. 2019, 10, 428–441, doi:10.3762/bjnano.10.42

• deposition and RF-magnetron sputtering for silver deposition. This method yields good dispersion of Ag-containing nanoparticles inside the parylene C polymer matrix. Film composition and structure were studied by using several techniques. It was found that the plasma generated by the RF-magnetron reactor

• increase the dielectric constant of NCPC without degrading its dielectric losses. In this context, this work presents a new strategy to synthesize nanocomposite parylene C materials by a combination of two processes, CVD and RF-magnetron sputtering. The NCPC properties are analyzed in detail by different

• ) and the inorganic compond (silver-containing nanoparticles). This method consists of two associated processes, i.e., primary vacuum-CVD and RF-magnetron sputtering. The deposition process of NCPC involves three successive operations. The process begins with the deposition of parylene C. Some hundreds

Geometrical optimisation of core–shell nanowire arrays for enhanced absorption in thin crystalline silicon heterojunction solar cells

• Robin Vismara,
• Olindo Isabella,
• Andrea Ingenito,
• Fai Tong Si and
• Miro Zeman

Beilstein J. Nanotechnol. 2019, 10, 322–331, doi:10.3762/bjnano.10.31

• , a 100 nm thick transparent tin-doped indium oxide (In2O3:Sn, ITO) was deposited at low power and low temperature, using radio-frequency (RF) magnetron sputtering. The cell area was defined as 5 mm × 5 mm, using a mask during ITO deposition. The reported equivalent thickness values of thin films on

Zn/F-doped tin oxide nanoparticles synthesized by laser pyrolysis: structural and optical properties

• Florian Dumitrache,
• Iuliana P. Morjan,
• Elena Dutu,
• Ion Morjan,
• Claudiu Teodor Fleaca,
• Monica Scarisoreanu,
• Alina Ilie,
• Marius Dumitru,
• Cristian Mihailescu,
• Adriana Smarandache and
• Gabriel Prodan

Beilstein J. Nanotechnol. 2019, 10, 9–21, doi:10.3762/bjnano.10.2

• atom %) made by spray pyrolysis showing high transparency and bandgap values between 3.86 and 4.45 eV have also been reported [32]. Other researchers have used radio frequency magnetron sputtering of mixed 30 wt % ZnO and 70 wt % SnO2 targets to obtain similar FZTO films, yet their reported different

Site-controlled formation of single Si nanocrystals in a buried SiO₂ matrix using ion beam mixing

• Xiaomo Xu,
• Thomas Prüfer,
• Daniel Wolf,
• Hans-Jürgen Engelmann,
• Lothar Bischoff,
• René Hübner,
• Karl-Heinz Heinig,
• Wolfhard Möller,
• Stefan Facsko,
• Johannes von Borany and
• Gregor Hlawacek

Beilstein J. Nanotechnol. 2018, 9, 2883–2892, doi:10.3762/bjnano.9.267

• -oxide-semiconductor (CMOS) technology and thus have yet to be integrated into a cost-efficient Si-based technology. Multiple methods have been proposed and optimized for Si NC fabrication, including plasma-enhanced chemical vapor deposition (PECVD) [4][10], magnetron sputtering [11][12], laser-induced

Optimization of Mo/Cr bilayer back contacts for thin-film solar cells

• Nima Khoshsirat,
• Fawad Ali,
• Vincent Tiing Tiong,
• Mojtaba Amjadipour,
• Hongxia Wang,
• Mahnaz Shafiei and
• Nunzio Motta

Beilstein J. Nanotechnol. 2018, 9, 2700–2707, doi:10.3762/bjnano.9.252

• chromium (Cr) adhesion layer is used as the back contact for a copper zinc tin sulfide (CZTS) thin-film solar cell on a SLG substrate. DC magnetron sputtering is used for deposition of Mo and Cr films. The conductivity of Mo/Cr bilayer films, their microstructure and surface morphology are studied at

• substrate using a Kurt J. Lesker PVD75 DC magnetron sputtering system operated at 40 W and 10 mTorr for 10 min, from a 2 inch Cr target (Kurt J. Lesker, 99.95% purity). The Mo layer was deposited on uncoated and Cr-coated substrates by using a 2 inch Mo target (Kurt J. Lesker, 99.95% purity) at different

Au–Si plasmonic platforms: synthesis, structure and FDTD simulations

• Anna Gapska,
• Marcin Łapiński,
• Paweł Syty,
• Wojciech Sadowski,
• Józef E. Sienkiewicz and
• Barbara Kościelska

Beilstein J. Nanotechnol. 2018, 9, 2599–2608, doi:10.3762/bjnano.9.241

• . Experimental Au nanostructures were prepared on Si(111) as a substrate. The substrates (1 × 1 cm2 of area) were cleaned with acetylacetone and then rinsed in ethanol. Thin Au films (with thicknesses in a range of 1.7–5.0 nm) were deposited using a table-top dc magnetron sputtering coater (EM SCD 500, Leica

Exploring the photoleakage current and photoinduced negative bias instability in amorphous InGaZnO thin-film transistors with various active layer thicknesses

• Dapeng Wang and
• Mamoru Furuta

Beilstein J. Nanotechnol. 2018, 9, 2573–2580, doi:10.3762/bjnano.9.239

• thicknesses were prepared by magnetron sputtering. The initial electrical properties and the photoleakage current of a-IGZO TFTs with various active layer thicknesses were investigated. The subthreshold value slightly increased while the threshold voltage (Vth) and mobility (μ) decreased with increasing TIGZO

• at 160 °C from a sintered IGZO ceramic target by DC magnetron sputtering with a mixed gas of Ar/O2 = 29.4/0.6 sccm at a deposition pressure of 1 Pa. After patterning of the IGZO films as the active channel, a SiOx etch-stopper (200 nm), source and drain electrodes, and a 200 nm-thick SiOx passivation

Thickness-dependent photoelectrochemical properties of a semitransparent Co₃O₄ photocathode

• Malkeshkumar Patel and
• Joondong Kim

Beilstein J. Nanotechnol. 2018, 9, 2432–2442, doi:10.3762/bjnano.9.228

• -Aldrich, sheet resistance of 7 Ω/sq) and a glass microscope slide were used as substrates. These were cleaned using a sequence of isopropyl alcohol, acetone and distilled water using ultrasonication. Then, various thicknesses of Co films were deposited using a dc magnetron sputtering system (dc power ca

ZnO-nanostructure-based electrochemical sensor: Effect of nanostructure morphology on the sensing of heavy metal ions

• Marina Krasovska,
• Vjaceslavs Gerbreders,
• Irena Mihailova,
• Andrejs Ogurcovs,
• Eriks Sledevskis,
• Andrejs Gerbreders and
• Pavels Sarajevs

Beilstein J. Nanotechnol. 2018, 9, 2421–2431, doi:10.3762/bjnano.9.227

• carried out with the LAB18 thin film deposition system (Kurt J. Lesker, USA) in DC magnetron sputtering mode. As a result, a set of electrodes consisted of four mutually separated planar elements, as illustrated in Figure 1. All of the manipulations described below were carried out using a metal mask

Magnetism and magnetoresistance of single Ni–Cu alloy nanowires

• Andreea Costas,
• Camelia Florica,
• Elena Matei,
• Maria Eugenia Toimil-Molares,
• Ionel Stavarache,
• Andrei Kuncser,
• Victor Kuncser and
• Ionut Enculescu

Beilstein J. Nanotechnol. 2018, 9, 2345–2355, doi:10.3762/bjnano.9.219

• 620 equipment situated into a cleanroom class 100 (ISO EN 14644) with RF magnetron sputtering and thermal vacuum evaporation (using TECTRA equipment). Thus, to contact single Ni–Cu alloy nanowires using a typical EBL process (Zeiss Merlin Compact field-emission scanning electron microscope combined

• , the deposition of Ti and Au contacts (100/200 nm) by RF magnetron sputtering and thermal vacuum evaporation, respectively, was performed. Individual contacted Ni–Cu alloy nanowires are thus obtained. The main steps of the EBL process are shown in Figure 8. The morphological and compositional

Influence of the thickness of an antiferromagnetic IrMn layer on the static and dynamic magnetization of weakly coupled CoFeB/IrMn/CoFeB trilayers

• Deepika Jhajhria,
• Dinesh K. Pandya and
• Sujeet Chaudhary

Beilstein J. Nanotechnol. 2018, 9, 2198–2208, doi:10.3762/bjnano.9.206

• (10 nm) were deposited at room temperature using pulsed-DC magnetron sputtering on naturally oxidized Si wafers with Ta (5 nm) seed and cap layers. The base pressure and working pressure of deposition were 2·10−7 and 4·10−3 Torr, respectively. The thickness tIrMn was systematically varied in 1 nm

Electrospun one-dimensional nanostructures: a new horizon for gas sensing materials

• Muhammad Imran,
• Nunzio Motta and
• Mahnaz Shafiei

Beilstein J. Nanotechnol. 2018, 9, 2128–2170, doi:10.3762/bjnano.9.202