Self-assembly of octadecyltrichlorosilane: Surface structures formed using different protocols of particle lithography

• ChaMarra K. Saner,
• Kathie L. Lusker,
• Zorabel M. LeJeune,
• Wilson K. Serem and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2012, 3, 114–122, doi:10.3762/bjnano.3.12

• the Si(111) substrate by liquid permeation through the latex mask. Particle lithography by immersion of latex-masked substrates in silane solutions A completely different morphology other than rings or nanopores was observed for OTS nanostructures produced by the immersion of particle masks. Dot

• deposited and spread evenly over the PDMS block, then quickly dried in a stream of ultra-high-purity argon. The PDMS block coated with OTS was placed on top of the masked substrate. The film of OTS was transferred from the PDMS block through the latex mask to the substrate by permeation. The areas of the Si