Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching

• Manuel R. Gonçalves,
• Taron Makaryan,
• Fabian Enderle,
• Stefan Wiedemann,
• Alfred Plettl,
• Othmar Marti and
• Paul Ziemann

Beilstein J. Nanotechnol. 2011, 2, 448–458, doi:10.3762/bjnano.2.49

• can be utilized in experiments requiring light confinement. Keywords: nanosphere-lithography; near-field enhancement; plasma etching; soft-lithography; surface plasmons; Introduction Classical electromagnetic theories describing optical transmission through small apertures [1][2] do not take into

• effects, such as optical resonances [5][6][7][8][9][10], near-field enhancements [11][12][13][14], enhanced scattering [15], enhanced transmission [3][4][16][17][18][19][20][21][22][23][24], and plasmonic whispering gallery modes [25][26][27]. Some of these effects have been explored in applications such

• structures with sharp edges, coated by gold films are suitable to confine light. The confinement efficiency and the plasmonic mode dispersion, leading to the highest near-field enhancements, need to be investigated in more depth. Conclusion Two novel methods of fabrication of plasmonic structures were

Scanning probe microscopy and related methods

• Ernst Meyer

Beilstein J. Nanotechnol. 2010, 1, 155–157, doi:10.3762/bjnano.1.18

• Microscopy, FMM: Force Modulation Microscopy, ic-AFM: intermittent contact AFM, TMAFM: tapping mode AFM, nc-AFM: non-contact AFM, KPFM: Kelvin probe force microscopy, EFM: Electrostatic force microscopy, MFM: Magnetic force microscopy, MRFM: Magnetic resonance force microscopy, NSOM: Near-field scanning