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Search for "milling" in Full Text gives 135 result(s) in Beilstein Journal of Nanotechnology.

Deformation-induced grain growth and twinning in nanocrystalline palladium thin films

  • Aaron Kobler,
  • Jochen Lohmiller,
  • Jonathan Schäfer,
  • Michael Kerber,
  • Anna Castrup,
  • Ankush Kashiwar,
  • Patric A. Gruber,
  • Karsten Albe,
  • Horst Hahn and
  • Christian Kübel

Beilstein J. Nanotechnol. 2013, 4, 554–566, doi:10.3762/bjnano.4.64

Graphical Abstract
  • -mortem TEM analysis were prepared either by focused ion beam (FIB) using a FEI Strata 400S DualBeam at 5 kV and 8 pA beam current for final polishing (sample ncPd 1) or by mechanical dimpling and Argon ion milling from the polyimide side at 2.5 kV in a PIPS (Gatan) (sample ncPd 2). FIB prepared samples
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Published 24 Sep 2013

Plasticity of nanocrystalline alloys with chemical order: on the strength and ductility of nanocrystalline Ni–Fe

  • Jonathan Schäfer and
  • Karsten Albe

Beilstein J. Nanotechnol. 2013, 4, 542–553, doi:10.3762/bjnano.4.63

Graphical Abstract
  • state was found after rolling at liquid nitrogen temperature to obtain a nanometer grain size [6]. In nanostructured Ni3Al processed by ball milling [7] or high pressure torsion [8], on the contrary, a complete loss of order is observed during preparation. Grain refinement by severe plastic deformation
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Published 19 Sep 2013

Grating-assisted coupling to nanophotonic circuits in microcrystalline diamond thin films

  • Patrik Rath,
  • Svetlana Khasminskaya,
  • Christoph Nebel,
  • Christoph Wild and
  • Wolfram H.P. Pernice

Beilstein J. Nanotechnol. 2013, 4, 300–305, doi:10.3762/bjnano.4.33

Graphical Abstract
  • waveguide fabricated this way is shown in Figure 1b. Focussed ion beam (FIB) milling is used to cut through a waveguide cross-section, which is the reason for the line features at the edge of the waveguide. The FIB image reveals that the sidewalls resulting from the etching are near vertical, illustrating
  • 15 nm rms is determined. (b) Cross-sectional SEM image of a nanophotonic waveguide cut by focussed-ion-beam milling. The diamond, e-beam resist, and buried oxide layers are marked in a false-colour overlay. (a) SEM image of a fabricated focussing grating coupler. Light propagating through the
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Published 07 May 2013

Diamond nanophotonics

  • Katja Beha,
  • Helmut Fedder,
  • Marco Wolfer,
  • Merle C. Becker,
  • Petr Siyushev,
  • Mohammad Jamali,
  • Anton Batalov,
  • Christopher Hinz,
  • Jakob Hees,
  • Lutz Kirste,
  • Harald Obloh,
  • Etienne Gheeraert,
  • Boris Naydenov,
  • Ingmar Jakobi,
  • Florian Dolde,
  • Sébastien Pezzagna,
  • Daniel Twittchen,
  • Matthew Markham,
  • Daniel Dregely,
  • Harald Giessen,
  • Jan Meijer,
  • Fedor Jelezko,
  • Christoph E. Nebel,
  • Rudolf Bratschitsch,
  • Alfred Leitenstorfer and
  • Jörg Wrachtrup

Beilstein J. Nanotechnol. 2012, 3, 895–908, doi:10.3762/bjnano.3.100

Graphical Abstract
  • surface of a standard diamond sample. Due to the small size, thousands of microscopic lenses could be fabricated into a single diamond sample, and moreover, each lens could be fabricated precisely around a single fluorescent color center. A suitable fabrication technique is focused ion beam milling. We
  • manufactured by sputtering and focused ion beam milling. Photon antibunching from a NV center inside a dielectric pillar cavity could be observed. In addition, a reproducible gas-phase doping approach to incorporate nickel and tungsten atoms during MWPECVD growth of single-crystal diamond films has been
  • microscopic diamond hemisphere by focused ion beam milling. (a) Grid of FIB markers for the precise alignment of the SIL on top of a single color center. (b) Fluorescence microscope image of one quadrant of FIB markers. The bright blue spots are single color centers. A color center a few microns below the
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Published 21 Dec 2012

Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices

  • Adrian Iovan,
  • Marco Fischer,
  • Roberto Lo Conte and
  • Vladislav Korenivski

Beilstein J. Nanotechnol. 2012, 3, 884–892, doi:10.3762/bjnano.3.98

Graphical Abstract
  • forms a hard mask for subsequent ion milling. After a 5 min Ar-plasma etch to remove surface residue, 7 min long ion milling etches through the 10 nm thick Au layer and slightly into the SiO2 substrate, thus transferring the hexagonal pattern of sub-10 nm polystyrene particles into sub-10 nm pattern of
  • photomask. The top electrode mask has different diameter disks and half-disks in the range of 10–50 µm. The pattern transfer is done by ion milling for 1 h. The etching time was calibrated by using surface profilometry such as to stop the etching at the Al bottom electrode. The sample was then capped with a
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Published 19 Dec 2012

Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching

  • Manuel R. Gonçalves,
  • Taron Makaryan,
  • Fabian Enderle,
  • Stefan Wiedemann,
  • Alfred Plettl,
  • Othmar Marti and
  • Paul Ziemann

Beilstein J. Nanotechnol. 2011, 2, 448–458, doi:10.3762/bjnano.2.49

Graphical Abstract
  • linked with the optical function of the structures. Current techniques for the fabrication of plasmonic cavities include electrochemical growth combined with nanosphere lithography [25][35], electron-beam lithography [36], etching techniques [37][38][39][40] and focused ion beam milling [41][42][43]. The
  • techniques based on electron beam lithography and focused ion beam milling allow us to obtain structures of arbitrary shape and two-dimensional profile, but they are size limited and time consuming. Applications outside of sensing are also envisaged. Plasmonic resonators can not only confine light but can
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Published 16 Aug 2011

Manipulation of gold colloidal nanoparticles with atomic force microscopy in dynamic mode: influence of particle–substrate chemistry and morphology, and of operating conditions

  • Samer Darwich,
  • Karine Mougin,
  • Akshata Rao,
  • Enrico Gnecco,
  • Shrisudersan Jayaraman and
  • Hamidou Haidara

Beilstein J. Nanotechnol. 2011, 2, 85–98, doi:10.3762/bjnano.2.10

Graphical Abstract
  • (FIB) milling technique. The width and depth of the pits are 650 nm and 5 nm, respectively, and the spacing between two adjacent pits is 125 nm. On the patterned surface, the mean direction of motion remains identical (on average), even after a long acquisition time. This stability of the direction of
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Published 04 Feb 2011

Biomimetics inspired surfaces for drag reduction and oleophobicity/philicity

  • Bharat Bhushan

Beilstein J. Nanotechnol. 2011, 2, 66–84, doi:10.3762/bjnano.2.9

Graphical Abstract
  • using a FlashCut CNC milling machine [21]. Bechert et al. [57] and Dean and Bhushan [22] have reported that optimal groove depth for the rib surface should be about half of the lateral rib spacing for low drag. In the rib pattern design selected here, multiple stacks of ribs oriented along an axis were
  • fabricated. For the fabrication, first a model of a rib-patterned surface was designed in SolidWorks, and then the code for the rib’s height, width, spacing and lengths, and channel dimensions was written with FeatureCAM in order to fabricate structures using the CNC milling machine. An acrylic resin was
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Published 01 Feb 2011

Magnetic coupling mechanisms in particle/thin film composite systems

  • Giovanni A. Badini Confalonieri,
  • Philipp Szary,
  • Durgamadhab Mishra,
  • Maria J. Benitez,
  • Mathias Feyen,
  • An Hui Lu,
  • Leonardo Agudo,
  • Gunther Eggeler,
  • Oleg Petracic and
  • Hartmut Zabel

Beilstein J. Nanotechnol. 2010, 1, 101–107, doi:10.3762/bjnano.1.12

Graphical Abstract
  • without ion-milling. The nanoparticle array showed a collective super-spin behavior due to dipolar interparticle coupling. In the composite system, we observed a decoupling into two nanoparticle subsystems. In the ion-milled system, the nanoparticle layer served as a magnetic flux guide as observed by
  • composites are prepared by physical growth methods, such as sputtering [18][19], sequential pulsed laser deposition [20][21], sputtering gas aggregation [22] or mechanical milling [23]. In this work, we report a different approach to fabricate composite nanoparticle/thin-film materials, i.e., which combines
  • a structural coherence length, as probed by scattering techniques, in the order of 200–300 nm [28]. AFM observations, shown in Figure 1a, also confirm the hexagonal close-packed ordering with an average surface roughness of the film of approximately 1.4 nm. Ion-milling carried out at the surface of
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Published 01 Dec 2010

Preparation and characterization of supported magnetic nanoparticles prepared by reverse micelles

  • Ulf Wiedwald,
  • Luyang Han,
  • Johannes Biskupek,
  • Ute Kaiser and
  • Paul Ziemann

Beilstein J. Nanotechnol. 2010, 1, 24–47, doi:10.3762/bjnano.1.5

Graphical Abstract
  • . Possibly the simplest approach is ball milling of the corresponding bulk materials. This mostly yields a rather broad size distribution, which, in turn, often hinders the study of size-dependent properties [15]. A better defined physical approach is inert-gas condensation where NPs are formed by sputtering
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Published 22 Nov 2010
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