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Search for "charge compensation" in Full Text gives 27 result(s) in Beilstein Journal of Nanotechnology.

Site-selective growth of surface-anchored metal-organic frameworks on self-assembled monolayer patterns prepared by AFM nanografting

  • Tatjana Ladnorg,
  • Alexander Welle,
  • Stefan Heißler,
  • Christof Wöll and
  • Hartmut Gliemann

Beilstein J. Nanotechnol. 2013, 4, 638–648, doi:10.3762/bjnano.4.71

Graphical Abstract
  • about 200 nm with nominal mass resolution (burst alignment mode). No charge compensation was required. Spectra were calibrated on omnipresent C−, CH−, CH2−, Au−, and molecular peaks. (a) Building units for the growth of MOF HKUST-1 and the unit cell of HKUST-1. (b) The principle of the layer-by-layer
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Published 11 Oct 2013

Noncontact atomic force microscopy study of the spinel MgAl2O4(111) surface

  • Morten K. Rasmussen,
  • Kristoffer Meinander,
  • Flemming Besenbacher and
  • Jeppe V. Lauritsen

Beilstein J. Nanotechnol. 2012, 3, 192–197, doi:10.3762/bjnano.3.21

Graphical Abstract
  • Co3O4(111) films with the spinel structure [13][14] show evidence for an apparently unreconstructed (1×1) surface, the stability of which was proposed to be based on a Co2+/Co3+ inversion process leading to charge compensation. In the present case of MgAl2O4(111), no previous experimental studies are
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Published 06 Mar 2012
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