9.1% efficient zinc oxide/silicon solar cells on a 50 μm thick Si absorber

• Rafal Pietruszka,
• Bartlomiej S. Witkowski,
• Monika Ozga,
• Katarzyna Gwozdz,
• Ewa Placzek-Popko and
• Marek Godlewski

Beilstein J. Nanotechnol. 2021, 12, 766–774, doi:10.3762/bjnano.12.60

• hafnium dioxide can be used as passivation film, which is deposited on the rear side of the silicon substrate. In such structures e–h pairs generated deep in a cell are separated more efficiently. The effect of rear passivation will be a topic of our further study how to improve the operation of ZnO/Si

Impact of GaAs(100) surface preparation on EQE of AZO/Al₂O₃/p-GaAs photovoltaic structures

• Piotr Caban,
• Rafał Pietruszka,
• Jarosław Kaszewski,
• Monika Ożga,
• Bartłomiej S. Witkowski,
• Krzysztof Kopalko,
• Piotr Kuźmiuk,
• Katarzyna Gwóźdź,
• Ewa Płaczek-Popko,
• Krystyna Lawniczak-Jablonska and
• Marek Godlewski

Beilstein J. Nanotechnol. 2021, 12, 578–592, doi:10.3762/bjnano.12.48

• the removal of the native oxide layer followed by an adequate surface passivation technique [13] and/or by a proper choice of the dielectric and its deposition method. Regarding the dielectric, the most common ones are aluminum oxide (Al2O3) and hafnium dioxide (HfO2) for which the preferable

Synthesis of hafnium nanoparticles and hafnium nanoparticle films by gas condensation and energetic deposition

• Irini Michelakaki,
• Nikos Boukos,
• Dimitrios A. Dragatogiannis,
• Spyros Stathopoulos,
• Costas A. Charitidis and
• Dimitris Tsoukalas

Beilstein J. Nanotechnol. 2018, 9, 1868–1880, doi:10.3762/bjnano.9.179

• study the fabrication and characterization of hafnium nanoparticles and hafnium nanoparticle thin films. Hafnium nanoparticles were grown in vacuum by magnetron-sputtering inert-gas condensation. The as deposited nanoparticles have a hexagonal close-packed crystal structure, they possess truncated

• hexagonal biprism shape and are prone to surface oxidation when exposed to ambient air forming core–shell Hf/HfO2 structures. Hafnium nanoparticle thin films were formed through energetic nanoparticle deposition. This technique allows for the control of the energy of charged nanoparticles during vacuum

• mechanical properties can be formed, without any additional treatment. It is shown that these films can be patterned on the substrate in sub-micrometer dimensions using conventional lithography while their porosity can be well controlled. The fabrication and experimental characterization of hafnium

Photocurrent generation in carbon nanotube/cubic-phase HfO₂ nanoparticle hybrid nanocomposites

• Protima Rauwel,
• Augustinas Galeckas,
• Martin Salumaa,
• Frédérique Ducroquet and
• Erwan Rauwel

Beilstein J. Nanotechnol. 2016, 7, 1075–1085, doi:10.3762/bjnano.7.101

• electron transfer is available for the generation of a photocurrent [11]. Experimental Synthesis: The procedure for synthesizing cubic HfO2 NPs was carried out in a glove box (O2 and H2O, <1 ppm). In a typical synthesis, hafnium tert-butoxide ((Hf(Ot-Bu)4) precursor (STREM 99.9%) (0.87 mmol) was added to

Synthesis of boron nitride nanotubes and their applications

• Saban Kalay,
• Zehra Yilmaz,
• Ozlem Sen,
• Melis Emanet,
• Emine Kazanc and
• Mustafa Çulha

Beilstein J. Nanotechnol. 2015, 6, 84–102, doi:10.3762/bjnano.6.9

• . Later, hafnium diboride (HfB2) electrodes [21], and conductive boron substances such as YB6 [22] were used to obtain BNNTs using this arc discharge method. Substitution reaction Due to the structural similarity between CNTs and BNNTs, BNNTs can be obtained from CNTs via substitution reactions. BNNTs

Organic and inorganic–organic thin film structures by molecular layer deposition: A review

• Pia Sundberg and
• Maarit Karppinen

Beilstein J. Nanotechnol. 2014, 5, 1104–1136, doi:10.3762/bjnano.5.123

Growth and characterization of CNT–TiO₂ heterostructures

• Yucheng Zhang,
• Ivo Utke,
• Johann Michler,
• Gabriele Ilari,
• Marta D. Rossell and
• Rolf Erni

Beilstein J. Nanotechnol. 2014, 5, 946–955, doi:10.3762/bjnano.5.108

• , e.g., trimethylaluminium for Al2O3, titanium tetraisopropoxide for TiO2, diethylzinc for ZnO, or tetrakis(ethylmethylamido)hafnium for HfO2, need surfaces that are terminated with a functional group, which would allow for their dissociative chemisorption reaction. Hydroxy-(OH)-group terminated

• trimethylaluminium and water ALD half-cycles [29] and tetrakis(ethylmethylamido)hafnium with water [30]. In contrast, thin conformal metal oxide ALD films can be easily obtained on organic polymers like polystyrene. Conformal 20 nm thin ZnO coatings were deposited using diethylzinc half-cycles alternated with water