Molecular dynamics modeling of the influence forming process parameters on the structure and morphology of a superconducting spin valve

• Alexander Vakhrushev,
• Aleksey Fedotov,
• Vladimir Boian,
• Roman Morari and
• Anatolie Sidorenko

Beilstein J. Nanotechnol. 2020, 11, 1776–1788, doi:10.3762/bjnano.11.160

• being issued [38][39][40]. The general scheme of the investigated nanosystem is presented in Figure 3. The numbers in Figure 3 next to the elements in the layers represent their thickness in nanometers. The sample production is carried out by the magnetron deposition method in vacuum. In general, a

• layered nanostructure consisting of Nb, CuNi, CoOx and Co layers, prepared by magnetron sputtering. High-resolution transmission electron microscopy (HR-TEM) image of a layered Co, CoOx and CuNi nanostructure prepared by magnetron sputtering. Sketch of a Nb/Co spin-valve nanosystem. The numbers next to

Piezoelectric sensor based on graphene-doped PVDF nanofibers for sign language translation

• Shuai Yang,
• Xiaojing Cui,
• Rui Guo,
• Zhiyi Zhang,
• Shengbo Sang and
• Hulin Zhang

Beilstein J. Nanotechnol. 2020, 11, 1655–1662, doi:10.3762/bjnano.11.148

• piezoelectric sensor. Ti3C2 MXene and Ag NWs maintain the good conductivity of the electrode and avoid possible short-circuit problems occurring after magnetron sputtering. Also, a stable flexibility of the structure is maintained. GR is added with six different mass fractions, that is, 0, 0.2, 0.4, 0.6, 0.8

A self-powered, flexible ultra-thin Si/ZnO nanowire photodetector as full-spectrum optical sensor and pyroelectric nanogenerator

• Liang Chen,
• Jianqi Dong,
• Miao He and
• Xingfu Wang

Beilstein J. Nanotechnol. 2020, 11, 1623–1630, doi:10.3762/bjnano.11.145

• deposited onto 45 μm p-Si by radio frequency (RF) magnetron sputtering. Next, the sample was placed into a solution of 0.877 g hexamethylenetetramine, 1.372 g Zn(CH3COO)2, and 13 mL ammonium hydroxide to grow ZnO NWs for half an hour via a hydrothermal method in a mechanical convection oven at 90 °C

• . Finally, by RF magnetron sputtering, a 200 nm thick layers of ITO and Cu were deposited on ZnO NWs and p-Si, respectively. Electrical measurements: the measurement setup includes a source meter, an optical platform, a chopper, sample, and a light source. Sample, chopper and light source must be in the

Oxidation of Au/Ag films by oxygen plasma: phase separation and generation of nanoporosity

• Abdel-Aziz El Mel,
• Said A. Mansour,
• Mujaheed Pasha,
• Atef Zekri,
• Janarthanan Ponraj,
• Akshath Shetty and
• Yousef Haik

Beilstein J. Nanotechnol. 2020, 11, 1608–1614, doi:10.3762/bjnano.11.143

• a high specific surface area. Experimental The Au/Ag films were deposited by magnetron co-sputtering of gold and silver targets (99.99% in purity). The electrical power applied to the gold and silver targets was fixed to 25 and 100 W, respectively. This yielded Au/Ag films with 75 atom % and 25 atom

Walking energy harvesting and self-powered tracking system based on triboelectric nanogenerators

• Mingliang Yao,
• Guangzhong Xie,
• Qichen Gong and
• Yuanjie Su

Beilstein J. Nanotechnol. 2020, 11, 1590–1595, doi:10.3762/bjnano.11.141

• . Fabrication of the u-TENG The u-TENG fabrication procedure was adapted, with modifications, from [34]. The back electrode was formed by depositing a Cu layer on the unmodified surface of a PTFE film via magnetron sputtering. A poly(dimethylsiloxane) (PDMS)-coated PTFE film was mounted onto a poly(ethylene

Antimicrobial metal-based nanoparticles: a review on their synthesis, types and antimicrobial action

• Matías Guerrero Correa,
• Fernanda B. Martínez,
• Cristian Patiño Vidal,
• Camilo Streitt,
• Juan Escrig and
• Carol Lopez de Dicastillo

Beilstein J. Nanotechnol. 2020, 11, 1450–1469, doi:10.3762/bjnano.11.129

• subsections. Physical methods Examples of physical methods used to synthesize NPs are the evaporation/condensation method, magnetron sputtering, mechanochemical processing (MCP), microwave-thermal method, photoreduction process, and pulsed laser ablation, among others. The evaporation/condensation method

• setup [23]. Magnetron sputtering is a high-rate vacuum-coating technique generally used to synthesize films, multilayer or hybrid systems based on substrate coating. For example, Piedade et al. obtained ZnO, ZnO–C and ZnO–Cu films with thickness values ranging from 385 to 1635 nm. In addition, Galstyan

Wafer-level integration of self-aligned high aspect ratio silicon 3D structures using the MACE method with Au, Pd, Pt, Cu, and Ir

• Mathias Franz,
• Romy Junghans,
• Paul Schmitt,
• Adriana Szeghalmi and
• Stefan E. Schulz

Beilstein J. Nanotechnol. 2020, 11, 1439–1449, doi:10.3762/bjnano.11.128

• PVD methods. The deposition of gold and palladium was done by magnetron sputtering. The film thickness has been adjusted by the use of a calibrated deposition rate. Ion beam sputter deposition (IBSD) has been used to deposit platinum and copper. For copper deposition, the thickness has been controlled

Controlling the proximity effect in a Co/Nb multilayer: the properties of electronic transport

• Sergey Bakurskiy,
• Mikhail Kupriyanov,
• Nikolay V. Klenov,
• Igor Soloviev,
• Andrey Schegolev,
• Roman Morari,
• Yury Khaydukov and
• Anatoli S. Sidorenko

Beilstein J. Nanotechnol. 2020, 11, 1336–1345, doi:10.3762/bjnano.11.118

• prepared by using the magnetron sputtering system Leybold Heraeus Z-400 during a single deposition cycle without depressurization of the chamber. Only three targets were used for the structure preparation: niobium (99.95% purity) was used as a superconducting Cooper pair generator and interlayer separator

Structural and electronic properties of SnO₂ doped with non-metal elements

• Jianyuan Yu,
• Yingeng Wang,
• Yan Huang,
• Xiuwen Wang,
• Jing Guo,
• Jingkai Yang and
• Hongli Zhao

Beilstein J. Nanotechnol. 2020, 11, 1321–1328, doi:10.3762/bjnano.11.116

• . Nguyen successfully prepared p-type N-doped SnO2 films using magnetron sputtering [9]. The results show that the SnO2 films were n-type semiconductors, and the concentration of free carriers in the film increased as the temperature for sedimentation increased. Also, p-type semiconductors were

Gram-scale synthesis of splat-shaped Ag–TiO₂ nanocomposites for enhanced antimicrobial properties

• Mohammad Jaber,
• Asim Mushtaq,
• Kebiao Zhang,
• Jindan Wu,
• Dandan Luo,
• Zihan Yi,
• M. Zubair Iqbal and
• Xiangdong Kong

Beilstein J. Nanotechnol. 2020, 11, 1119–1125, doi:10.3762/bjnano.11.96

• , magnetron sputtering, molecular precursor techniques and photo-deposition techniques have been applied to the preparation of nanocomposites [6][21][22]. However, these techniques are very sophisticated and not optimized for synthesis on a large scale. Herein, a simple hydrothermal process was employed to

Electrochemical nanostructuring of (111) oriented GaAs crystals: from porous structures to nanowires

• Elena I. Monaico,
• Eduard V. Monaico,
• Veaceslav V. Ursaki,
• Shashank Honnali,
• Vitalie Postolache,
• Karin Leistner,
• Kornelius Nielsch and
• Ion M. Tiginyanu

Beilstein J. Nanotechnol. 2020, 11, 966–975, doi:10.3762/bjnano.11.81

• followed by 250 nm Au layer was sputtered using a magnetron from Torr International Inc model No: CRC622-2G2-RF-DC and lift-off was performed with Microposit remover 1165 at 50 °C. Photoelectrical characterization. To excite photoconductivity in the GaAs nanowires, the radiation from a Xenon lamp DKSS-150

Band tail state related photoluminescence and photoresponse of ZnMgO solid solution nanostructured films

• Vadim Morari,
• Aida Pantazi,
• Nicolai Curmei,
• Vitalie Postolache,
• Emil V. Rusu,
• Marius Enachescu,
• Ion M. Tiginyanu and
• Veaceslav V. Ursaki

Beilstein J. Nanotechnol. 2020, 11, 899–910, doi:10.3762/bjnano.11.75

• radio-frequency plasma-assisted molecular beam epitaxy (RF-MBE) [2][7][10][11], DC [12][13] and RF [1][3][6] magnetron sputtering, pulsed laser deposition (PLD) [14][15], plasma-enhanced atomic layer deposition (PE-ALD) [16], chemical vapor deposition (CVD) [17], metal–organic chemical vapor deposition

• –0.78 for Zn1−xMgxO thin films grown by reactive DC magnetron co-sputtering [12]. It was shown that this investigation technique is highly sensitive for the detection of embedded structural inhomogeneities, and it was found that the phase segregation occurs in the range of x = 0.35–0.65 with coexistence

Epitaxial growth and superconducting properties of thin-film PdFe/VN and VN/PdFe bilayers on MgO(001) substrates

• Wael M. Mohammed,
• Igor V. Yanilkin,
• Amir I. Gumarov,
• Airat G. Kiiamov,
• Roman V. Yusupov and
• Lenar R. Tagirov

Beilstein J. Nanotechnol. 2020, 11, 807–813, doi:10.3762/bjnano.11.65

• analysis system. The VN layers were reactively magnetron sputtered from a metallic vanadium target in Ar/N2 plasma, while the Pd1−xFex layers were deposited by co-evaporation of metallic Pd and Fe pellets from calibrated effusion cells in a molecular beam epitaxy chamber. The VN stoichiometry and Pd1−xFex

• ) and Fe (99.97% purity, ChemPur GmbH, Germany) were co-evaporated from the pre-calibrated high-temperature effusion cells to obtain the desired Pd1−xFex composition. Vanadium nitride layers were synthesized by using reactive DC magnetron sputtering (MS) in the UHV chamber with a base pressure of p ≤ 5

• synthesis of VN. During the deposition process, the pressure of the Ar/N2 gas mixture in the chamber was automatically kept at 6 × 10−3 mbar. A metallic vanadium disk of 99.95% purity (GIRMET Ltd, Russia) was used as a target. The magnetron power was 50 W, the distance between the target and the substrate

A set of empirical equations describing the observed colours of metal–anodic aluminium oxide–Al nanostructures

• Cristina V. Manzano,
• Jakob J. Schwiedrzik,
• Gerhard Bürki,
• Laszlo Pethö,
• Johann Michler and
• Laetitia Philippe

Beilstein J. Nanotechnol. 2020, 11, 798–806, doi:10.3762/bjnano.11.64

• Alliance-Concept DP 650 DC magnetron sputtering equipment. 25, 17.5 and 10 nm thin films of gold were deposited on top of the AAO films using a Leica EM ACE600 sputtering equipment. The Au layers were deposited using a sputtering pressure and intensity of 5 × 10−2 mbar and 30 mA, respectively, and the Cr

Effect of Ag loading position on the photocatalytic performance of TiO₂ nanocolumn arrays

• Jinghan Xu,
• Yanqi Liu and
• Yan Zhao

Beilstein J. Nanotechnol. 2020, 11, 717–728, doi:10.3762/bjnano.11.59

• photolithography and the template method by Sung et al. [30]. In this case, Ag particles were loaded on the outside of the nanocolumns by magnetron sputtering, and the catalysis was carried out at a sputtering time of 30 min. Besides, Jani et al. [31] studied the preparation of TiO2 nanotube arrays by anodization

Structural optical and electrical properties of a transparent conductive ITO/Al–Ag/ITO multilayer contact

• Aliyu Kabiru Isiyaku,
• Ahmad Hadi Ali and
• Nafarizal Nayan

Beilstein J. Nanotechnol. 2020, 11, 695–702, doi:10.3762/bjnano.11.57

• enhanced optical transmittance. Conclusion ITO/Al-Ag/ITO (IAAI) multilayer films were deposited by RF and DC magnetron sputtering at room temperature. The inclusion of the Al–Ag bilayer coupled with annealing at 400 °C significantly enhanced the microstructural, optical and electrical properties of the

• measurements) were used as substrates. Decon90 glass cleaner was used for glass substrate cleansing. Thin film preparation A SNTEK Korea magnetron sputtering system with a dual radio frequency (RF)/direct current (DC) sputtering source with a main deposition chamber 15.7 inches in height and 23.6 inches in

Evolution of Ag nanostructures created from thin films: UV–vis absorption and its theoretical predictions

• Robert Kozioł,
• Marcin Łapiński,
• Paweł Syty,
• Damian Koszelow,
• Wojciech Sadowski,
• Józef E. Sienkiewicz and
• Barbara Kościelska

Beilstein J. Nanotechnol. 2020, 11, 494–507, doi:10.3762/bjnano.11.40

• thickness) were deposited using a table-top dc magnetron sputtering coater (EM SCD 500, Leica) in pure Ar plasma (argon, Air Products 99.999%). The Ag target was of 99.99% purity, the rate of layer deposition was about 0.4 nm·s−1, and the incident power was in the range of 30–40 W. The layer thickness was

Advanced hybrid nanomaterials

• Andreas Taubert,
• Fabrice Leroux,
• Pierre Rabu and
• Verónica de Zea Bermudez

Beilstein J. Nanotechnol. 2019, 10, 2563–2567, doi:10.3762/bjnano.10.247

• electronic devices” [29]. A combination of deposition techniques was used, chemical vapor deposition for parylene and RF-magnetron sputtering for silver nanoparticles. The content and size of the latter influences the dielectric characteristics of the resulting hybrid films. Such devices may find application

Formation of metal/semiconductor Cu–Si composite nanostructures

• Natalya V. Yumozhapova,
• Andrey V. Nomoev,
• Vyacheslav V. Syzrantsev and
• Erzhena C. Khartaeva

Beilstein J. Nanotechnol. 2019, 10, 2497–2504, doi:10.3762/bjnano.10.240

• they are immiscible in the bulk state. In addition to chemical techniques [9][10][11][12], physical methods such as gas-phase methods [5][6][15], laser ablation [7][8][16], and magnetron-sputter gas-phase condensation [17] have been developed. When these methods are combined with the possibility of

Facile synthesis of carbon nanotube-supported NiO//Fe₂O₃ for all-solid-state supercapacitors

• Shengming Zhang,
• Xuhui Wang,
• Yan Li,
• Xuemei Mu,
• Yaxiong Zhang,
• Jingwei Du,
• Guo Liu,
• Xiaohui Hua,
• Yingzhuo Sheng,
• Erqing Xie and
• Zhenxing Zhang

Beilstein J. Nanotechnol. 2019, 10, 1923–1932, doi:10.3762/bjnano.10.188

• . deposited iron oxide on CNTs by atomic layer deposition (ALD) and the obtained CNTs@Fe2O3 presented a specific capacitance of 580.6 F·g−1 at 5 A·g−1 [21]. Zhang et al. used magnetron sputtering to prepare sandwich-like CNT@Fe2O3@C structures, and the composite exhibited a specific capacitance of 787.5 F·g−1

Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering

• Hamidreza Hajihoseini,
• Movaffaq Kateb,
• Snorri Þorgeir Ingvarsson and
• Jon Tomas Gudmundsson

Beilstein J. Nanotechnol. 2019, 10, 1914–1921, doi:10.3762/bjnano.10.186

• -100 44, Stockholm, Sweden 10.3762/bjnano.10.186 Abstract Background: Oblique angle deposition is known for yielding the growth of columnar grains that are tilted in the direction of the deposition flux. Using this technique combined with high-power impulse magnetron sputtering (HiPIMS) can induce

• unique properties in ferromagnetic thin films. Earlier we have explored the properties of polycrystalline and epitaxially deposited permalloy thin films deposited under 35° tilt using HiPIMS and compared it with films deposited by dc magnetron sputtering (dcMS). The films prepared by HiPIMS present lower

• properties for some important technological applications in addition to the ability to fill high aspect ratio trenches and coating on cutting tools with complex geometries. Keywords: glancing angle deposition (GLAD); high-power impulse magnetron sputtering (HiPIMS); oblique angle deposition; magnetron

Fabrication and characterization of Si_1−xGe_x nanocrystals in as-grown and annealed structures: a comparative study

• Muhammad Taha Sultan,
• Adrian Valentin Maraloiu,
• Ionel Stavarache,
• Jón Tómas Gudmundsson,
• Andrei Manolescu,
• Valentin Serban Teodorescu,
• Magdalena Lidia Ciurea and
• Halldór Gudfinnur Svavarsson

Beilstein J. Nanotechnol. 2019, 10, 1873–1882, doi:10.3762/bjnano.10.182

• , 050094 Bucharest, Romania 10.3762/bjnano.10.182 Abstract Multilayer structures comprising of SiO2/SiGe/SiO2 and containing SiGe nanoparticles were obtained by depositing SiO2 layers using reactive direct current magnetron sputtering (dcMS), whereas, Si and Ge were co-sputtered using dcMS and high-power

• impulse magnetron sputtering (HiPIMS). The as-grown structures subsequently underwent rapid thermal annealing (550–900 °C for 1 min) in N2 ambient atmosphere. The structures were investigated using X-ray diffraction, high-resolution transmission electron microscopy together with spectral photocurrent

• consequential interface characteristics and its effect on the photocurrent spectra. Keywords: grazing incidence XRD (GIXRD); high-power impulse magnetron sputtering (HiPIMS); HRTEM; magnetron sputtering; photocurrent spectra; SiGe nanocrystals in SiO2/SiGe/SiO2 multilayers; STEM-HAADF; TEM; Introduction

Subsurface imaging of flexible circuits via contact resonance atomic force microscopy

• Wenting Wang,
• Chengfu Ma,
• Yuhang Chen,
• Lei Zheng,
• Huarong Liu and
• Jiaru Chu

Beilstein J. Nanotechnol. 2019, 10, 1636–1647, doi:10.3762/bjnano.10.159

• 11 wt % PMMA in anisole solvent at 1500 rpm for 5 min, resulting in a thickness of approximately 3.5 µm. Then, a 300 nm thick Au film was sputtered on the PMMA substrate by using magnetron sputtering. The Au film was subsequently patterned by focused ion beam (FIB) milling (FEI, Helios NanoLab 650

Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering

• Petronela Prepelita,
• Ionel Stavarache,
• Doina Craciun,
• Florin Garoi,
• Catalin Negrila,
• Beatrice Gabriela Sbarcea and
• Valentin Craciun

Beilstein J. Nanotechnol. 2019, 10, 1511–1522, doi:10.3762/bjnano.10.149

• temperature by radio-frequency magnetron sputtering (rfMS). After deposition, the films were subjected to a RTA process at 575 °C (heating rate 20 °C/s), maintained at this temperature for 10 minutes, then cooled down to room temperature at a rate of 20 °C/s. The film structure was modified by changing the

• treatment in an open atmosphere. Such films could be used to manufacture transparent contact electrodes for solar cells. Keywords: conductive transparent electrodes; indium tin oxide (ITO) films; optical properties; radio-frequency magnetron sputtering (rfMS); rapid thermal annealing (RTA); Introduction

• of ITO in various applications increases when the electrical properties are improved. Various deposition techniques have been used to obtain TCO thin films, such as: vacuum thermal evaporation [15][16], chemical vapor deposition [17], sol–gel [18], pyrolysis spray techniques [5][19], magnetron

Gas sensing properties of individual SnO₂ nanowires and SnO₂ sol–gel nanocomposites

• Alexey V. Shaposhnik,
• Dmitry A. Shaposhnik,
• Sergey Yu. Turishchev,
• Olga A. Chuvenkova,
• Stanislav V. Ryabtsev,
• Alexey A. Vasiliev,
• Xavier Vilanova,
• Francisco Hernandez-Ramirez and
• Joan R. Morante

Beilstein J. Nanotechnol. 2019, 10, 1380–1390, doi:10.3762/bjnano.10.136

• and high surface-to-volume ratio, obtained by sintering, are traditionally used as sensing materials. By means of preparation methods such as magnetron sputtering, laser ablation, and pulverization, layer-by-layer nanoparticle deposition can be achieved with adhesion to the substrate and to previously

• ; this difference can be related to the contributions from the sorbed components. The O 1s component at 532 eV binding energy, prevailing on wire-like sample surfaces, was previously observed on metallic tin foil surfaces stored under laboratory conditions [38] and for magnetron sputtered tin nanolayers

• intensity of the 533.6 eV component (Figure 6) of the O 1s line [51]. Previously, this component was observed on polycrystalline nanolayers formed by magnetron sputtering of tin and ambient air oxidation afterwards [47]. Figure 7 compares XANES Sn M4,5 spectra of the samples with those obtained on the SnO2