Mechanical property measurements enabled by short-term Fourier-transform of atomic force microscopy thermal deflection analysis

• Thomas Mathias,
• Roland Bennewitz and
• Philip Egberts

Beilstein J. Nanotechnol. 2025, 16, 1952–1962, doi:10.3762/bjnano.16.136

• ); mechanical property measurements; surface science; Introduction Atomic force microscopy (AFM) has become an indispensable tool for imaging the surface topography on a variety of surfaces [1]. Since the invention of the AFM [2], several other modes of AFM have been developed, including friction force

Enhanced feedback performance in off-resonance AFM modes through pulse train sampling

• Mustafa Kangül,
• Navid Asmari,
• Santiago H. Andany,
• Marcos Penedo and
• Georg E. Fantner

Beilstein J. Nanotechnol. 2024, 15, 134–143, doi:10.3762/bjnano.15.13

• contrast mapping of the sample in real time. However, the topography feedback error should be minimized to reduce the effect of sample topography on the mechanical property measurements. For example, the dissipated energy on the sample, simply the integral of the area between the approach and the retract

Nanoscale spatial mapping of mechanical properties through dynamic atomic force microscopy

• Zahra Abooalizadeh,
• Leszek Josef Sudak and
• Philip Egberts

Beilstein J. Nanotechnol. 2019, 10, 1332–1347, doi:10.3762/bjnano.10.132

• (FMM) and contact resonance (CR) AFM, will allow for the overarching goal of nanoscale mechanical property measurements to be realized. In FMM, the tip is pressed into contact with the surface and oscillated at a frequency off resonance. The obtained variations in the measured amplitude of the

• the acquired phase images in CR-AFM or FMM-AFM results, suggesting no additional viscoelastic energy losses from modulating the applied load during scanning at the step edge. Thus, the presence of the Schwoebel barrier did not significantly impact the mechanical property measurements. We further

Relationships between chemical structure, mechanical properties and materials processing in nanopatterned organosilicate fins

• Gheorghe Stan,
• Richard S. Gates,
• Qichi Hu,
• Kevin Kjoller,
• Craig Prater,
• Kanwal Jit Singh,
• Ebony Mays and
• Sean W. King

Beilstein J. Nanotechnol. 2017, 8, 863–871, doi:10.3762/bjnano.8.88

• with contact resonance AFM (CR-AFM) [29] mechanical property measurements in the investigation of 20–500 nm wide fin structures fabricated in a nanoporous organosilicate thin film. Nanoporous organosilicates are of significant importance to the electronics industry for reducing various parasitic

• removal and reinsertion of terminal organic (CH3) groups in the matrix. Further examination of this effect as a function of fin width and additional recently demonstrated depth-profiling CR-AFM mechanical property measurements [34] indicate that the loss of CH3 groups and the increase of mechanical